Reiko KIMURA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2014-10-02

Top Assignees for applications by Reiko KIMURA

The entities that hold a legal rights for patent applications filed by inventor KIMURA Reiko:

Reiko KIMURA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Resist pattern-forming method, and radiation-sensitive resin composition

Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film

Resist pattern-forming method, and radiation-sensitive resin composition

Pattern-forming method, and radiation-sensitive resin composition

Radiation-sensitive resin composition, polymer and compound

Radiation-sensitive resin composition and resist film formed using the same

Radiation-sensitive resin composition, method for forming resist pattern and polymer

InventorID:

354367 ⎘