Jun Sato

City:

Nirasaki-shi

Country:

Japan

Published Applications:

Last publication date:

2011-08-18

Top Assignees for applications by Jun Sato

The entities that hold a legal rights for patent applications filed by inventor Sato Jun:

TOKYO ELECTRON LIMITED 5 Tokyo, Japan
TOKYO ELECTRON LIMITED 1 Tokyo-To, Japan

Recent patent applications by Sato Jun

Jun Sato from Nirasaki-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2011-08-18

US20110201210A1

Chemistry; metallurgy

Film formation method, film formation apparatus, and method for using film formation apparatus

#2 | 2010-11-04

US20100278999A1

Mechanical engineering

Plasma process apparatus and plasma process method

#3 | 2010-07-29

US20100189927A1

Chemistry; metallurgy

Film formation apparatus and method for using same

#4 | 2009-07-16

US20090181548A1

Chemistry; metallurgy

Vertical plasma processing method for forming silicon containing film

#5 | 2009-05-14

US20090124087A1

Chemistry; metallurgy

Vertical plasma processing apparatus and method for using same

#6 | 2009-05-14

US20090124083A1

Chemistry; metallurgy

Film formation apparatus and method for using same

#7 | 2009-05-07

US20090117743A1

Chemistry; metallurgy

Film formation apparatus and method for using same

#8 | 2009-05-07

US20090114156A1

Chemistry; metallurgy

Film formation apparatus for semiconductor process

#9 | 2007-10-11

US20070234961A1

Chemistry; metallurgy

VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR PROCESS

InventorID:

3563638 ⎘