Campbell, California
United States
16
2011-07-05
The entities that hold a legal rights for patent applications filed by inventor Wang Shulin:
Shulin Wang from Campbell, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and apparatus for forming a high quality low temperature silicon nitride layer
#2 | 2010-06-17Substrate carrier with enhanced temperature uniformity
#3 | 2010-02-04Method and Apparatus for Forming a High Quality Low Temperature Silicon Nitride Layer
#4 | 2008-12-11Tungsten nitride atomic layer deposition processes
#5 | 2008-04-24Gas distribution assembly for use in a semiconductor work piece processing reactor
#6 | 2007-12-13Deposition of nano-crystal silicon using a single wafer chamber
#7 | 2007-07-19Assembly and method for delivering a reactant material onto a substrate
#8 | 2007-01-25Tungsten nitride atomic layer deposition processes
#9 | 2006-12-21Gate electrode dopant activation method for semiconductor manufacturing
#10 | 2006-02-02Thin tungsten silicide layer deposition and gate metal integration
#11 | 2006-02-02Method of forming a controlled and uniform lightly phosphorous doped silicon film
#12 | 2006-01-26Deposition of nano-crystal silicon using a single wafer chamber
#13 | 2006-01-03Method of forming a controlled and uniform lightly phosphorous doped silicon film
#14 | 2005-11-17Method for silicon nitride chemical vapor deposition
#15 | 2005-08-25Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal
#16 | 2005-08-11Cyclical deposition of tungsten nitride for metal oxide gate electrode
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