Livermore, California
United States
13
2013-08-01
The entities that hold a legal rights for patent applications filed by inventor Pipitone John A.:
John A. Pipitone from Livermore, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS
#2 | 2012-04-26RF impedance matching network with secondary frequency and sub-harmonic variant
#3 | 2012-04-26RF IMPEDANCE MATCHING NETWORK WITH SECONDARY DC INPUT
#4 | 2010-12-16Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
#5 | 2010-12-16Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
#6 | 2010-04-15CONTROL OF EROSION PROFILE ON A DIELECTRIC RF SPUTTER TARGET
#7 | 2010-01-21Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
#8 | 2010-01-21Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
#9 | 2009-08-06Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture
#10 | 2008-11-13Substrate cleaning chamber and cleaning and conditioning methods
#11 | 2008-01-17Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture
#12 | 2007-08-23Physical vapor deposition plasma reactor with arcing suppression
#13 | 2007-01-11Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products
359780 ⎘