Daniel J. Devine

SLOTTED ELECTROSTATIC SHIELD MODIFICATION FOR IMPROVED ETCH AND CVD PROCESS UNIFORMITY

Selective reflectivity process chamber with customized wavelength response and method

Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrate

Process and System For Varying the Exposure to a Chemical Ambient in a Process Chamber

Method and Apparatus for Plasma Process Performance Matching in Multiple Wafer Chambers

Workpiece support with fluid zones for temperature control

Advanced multi-workpiece processing chamber

Method and system for thermally processing a plurality of wafer-shaped objects

Multi-workpiece processing chamber

Low cost high throughput processing platform

Slotted electrostatic shield modification for improved etch and CVD process uniformity

Selective reflectivity process chamber with customized wavelength response and method

Slotted electrostatic shield modification for improved etch and CVD process uniformity

Seal arrangement with corrosion barrier and method

Low cost high throughput processing platform

Process and system for heating semiconductor substrates in a processing chamber containing a susceptor

Wedge-shaped window for providing a pressure differential

Multi-workpiece processing chamber

Advanced multi-pressure workpiece processing

Shadow-free shutter arrangement and method

Selective reflectivity process chamber with customized wavelength response and method