Inventor profile of:

Stephen E. Savas

City:

San Jose, California

Country:

United States

Published Applications:

15

Last publication date:

2025-07-17

Top Assignees for applications by Stephen E. Savas

The entities that hold a legal rights for patent applications filed by inventor Savas Stephen E.:

Recent patent applications by Savas Stephen E.

Stephen E. Savas from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-07-17
US20250232955A1
Electricity

PULSING CONTROL MATCH NETWORK AND GENERATOR

#2 | 2024-05-02
US20240145221A1
Electricity

Inductive broad-band sensors for electromagnetic waves

#3 | 2021-07-22
US20210225613A1
Electricity

Pulsing control match network

#4 | 2021-07-15
US20210217595A1
Electricity

Inductive broad-band sensors for electromagnetic waves

#5 | 2021-07-15
US20210217593A1
Electricity

Sector shunts for plasma-based wafer processing systems

#6 | 2021-07-15
US20210217590A1
Electricity

Fast arc detecting match network

#7 | 2021-07-15
US20210217589A1
Electricity

Uniformity control for radio frequency plasma processing systems

#8 | 2021-07-15
US20210217588A1
Electricity

AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCESSING SYSTEMS

#9 | 2021-07-15
US20210217587A1
Electricity

Plasma non-uniformity detection

#10 | 2013-08-01
US20130196510A1
Electricity

SLOTTED ELECTROSTATIC SHIELD MODIFICATION FOR IMPROVED ETCH AND CVD PROCESS UNIFORMITY

#11 | 2007-06-19
US10803453
-

Slotted electrostatic shield modification for improved etch and CVD process uniformity

#12 | 2007-05-24
US20070113979A1
Electricity

Slotted electrostatic shield modification for improved etch and CVD process uniformity

#13 | 2006-03-02
US20060045667A1
Electricity

Substrate handling system and process for manufacturing large substrates

#14 | 2006-01-19
US20060011582A1
Electricity

Fast isotropic etching system and process for large, non-circular substrates

#15 | 2006-01-19
US20060011581A1
Electricity

Uniform etching system and process for large rectangular substrates

InventorID:

366084 ⎘