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Inventor profile of:

Roderick Koehle

City:

Ottobrunn

Country:

Germany

Published Applications:

7

Last publication date:

2010-10-21

Top Assignees for applications by Roderick Koehle

The entities that hold a legal rights for patent applications filed by inventor Koehle Roderick:

  • Infineon Technologies AG 4 Munich, Germany
  • INFINEON TECHNOLOGIES AG 1 Neubiberg, Germany
  • Advanced Mask Technology Center GmbH & Co. KG 1 , Germany

Recent patent applications by Koehle Roderick

Roderick Koehle from Ottobrunn, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2010-10-21
US20100266939A1
Physics

Lithographic mask and method of forming a lithographic mask

#2 | 2009-04-09
US20090092926A1
Physics

Lithography systems and methods of manufacturing using thereof

#3 | 2009-04-09
US20090091729A1
Physics

Lithography Systems and Methods of Manufacturing Using Thereof

#4 | 2007-08-28
US10735414
-

Method for inspection of periodic grating structures on lithography masks

#5 | 2007-02-15
US20070038972A1
Physics

Method for optimizing a photolithographic mask

#6 | 2005-07-07
US20050148195A1
Physics

Method for determining the construction of a mask for the micropatterning of semiconductor substrates by means of photolithography

#7 | 2005-03-03
US20050048379A1
Physics

Method for checking periodic structures on lithography masks

InventorID:

3675968 ⎘

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