United States
21
2014-01-09
The entities that hold a legal rights for patent applications filed by inventor TOKYO ELECTRON LIMITED:
TOKYO ELECTRON LIMITED from , US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of stripping photoresist on a single substrate system
#2 | 2013-10-10Stable surface wave plasma source
#3 | 2013-08-29METHOD FOR CALCULATING BILL FOR USE OF WATER PURIFICATION SYSTEM AND WATER PURIFICATION SYSTEM
#4 | 2013-08-29Plasma tuning rods in microwave resonator plasma sources
#5 | 2013-08-29TEMPLATE AND SUBSTRATE PROCESSING METHOD
#6 | 2013-08-29Peripheral exposure method and apparatus therefor
#7 | 2013-08-29Liquid processing apparatus, liquid processing method, and storage medium that stores computer program for implementing liquid processing method
#8 | 2013-08-29Substrate processing apparatus
#9 | 2013-08-29SUBSTRATE MOUNTING TABLE AND PLASMA ETCHING APPARATUS
#10 | 2013-08-29Process liquid changing method and substrate processing apparatus
#11 | 2013-08-29Cooling system, substrate processing apparatus having cooling system and cooling method
#12 | 2013-08-22METHOD AND APPARATUS FOR FILLING METAL PASTE, AND METHOD FOR FABRICATING VIA PLUG
#13 | 2013-08-22PLASMA PROCESSING APPARATUS
#14 | 2013-08-22Method for purging a substrate container
#15 | 2013-08-22Mask pattern forming method, fine pattern forming method, and film deposition apparatus
#16 | 2013-08-15Substrate processing apparatus and substrate processing method
#17 | 2013-08-15TEMPERATURE SENSOR AND HEAT TREATING APPARATUS
#18 | 2013-08-15Liquid processing apparatus, liquid processing method and storage medium
#19 | 2013-08-15Substrate processing scrubber, substrate processing apparatus and substrate processing method
#20 | 2013-08-15FILM DEPOSITION APPARATUS
#21 | 2013-08-15GAS SUPPLY APPARATUS AND HEAT TREATMENT APPARATUS
381811 ⎘