Abtsgmuend
Germany
15
2019-10-10
The entities that hold a legal rights for patent applications filed by inventor Walter Holger:
Holger Walter from Abtsgmuend, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#2 | 2018-10-18EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#3 | 2018-07-12Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective
#4 | 2017-11-02EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#5 | 2016-09-01Projection exposure apparatus with optimized adjustment possibility
#6 | 2016-07-28Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus
#7 | 2016-07-07EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#8 | 2016-01-07Microlithographic apparatus and method of varying a light irradiance distribution
#9 | 2014-11-06Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus
#10 | 2014-06-26Projection exposure apparatus with optimized adjustment possibility
#11 | 2013-07-11Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
#12 | 2013-06-06EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#13 | 2013-01-17Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same
#14 | 2012-07-26Projection exposure apparatus with optimized adjustment possibility
#15 | 2011-07-28Projection exposure apparatus with optimized adjustment possibility
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