Daniela White

City:

Oswego, Illinois

Country:

United States

Published Applications:

Last publication date:

2009-05-28

Top Assignees for applications by Daniela White

The entities that hold a legal rights for patent applications filed by inventor White Daniela:

Daniela White from Oswego, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Copper-passivating CMP compositions and methods

SLURRIES FOR POLISHING OXIDE AND NITRIDE WITH HIGH REMOVAL RATES

Polishing composition and method utilizing abrasive particles treated with an aminosilane

Low pH barrier slurry based on titanium dioxide

Copper CMP composition containing ionic polyelectrolyte and method

Ruthenium CMP compositions and methods

CMP compositions containing a soluble peroxometalate complex and methods of use thereof

Polyoxometalate compositions and methods

InventorID:

3873442 ⎘