Valentin N. Todorow

Method of controlling CD bias and CD microloading by changing the ceiling-to-wafer gap in a plasma reactor

Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process

Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

Cathode liner with wafer edge gas injection in a plasma reactor chamber

Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Plasma etch process for controlling line edge roughness