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Inventor profile of:

JSR CORPORATION

City:

Country:

United States

Published Applications:

Last publication date:

2015-02-19

Top Assignees for applications by JSR CORPORATION

The entities that hold a legal rights for patent applications filed by inventor JSR CORPORATION:

JSR Corporation 11 Tokyo, Japan

Recent patent applications by JSR CORPORATION

JSR CORPORATION from , US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-02-19

US20150048046A1

Chemistry; metallurgy

Method for forming pattern, and polysiloxane composition

#2 | 2013-11-14

US20130299946A1

Electricity

Substrate treating method, stack and semiconductor device

#3 | 2013-10-17

US20130273476A1

Physics

Pattern-forming method, resist underlayer film, and composition for forming resist underlayer film

#4 | 2013-08-29

US20130224666A1

Physics

Resist pattern-forming method, and radiation-sensitive resin composition

#5 | 2013-08-29

US20130224661A1

Physics

Pattern-forming method, and radiation-sensitive resin composition

#6 | 2013-08-29

US20130220930A1

Performing operations; transporting

Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate

#7 | 2013-08-22

US20130217850A1

Chemistry; metallurgy

Composition for forming liquid immersion upper layer film, and polymer

#8 | 2013-08-22

US20130216961A1

Physics

Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

#9 | 2013-08-22

US20130216951A1

Physics

Radiation-sensitive resin composition, polymer and compound

#10 | 2013-08-22

US20130216948A1

Physics

Radiation-sensitive resin composition and pattern-forming method

#11 | 2013-08-15

US20130209875A1

Electricity

Electrode binder composition, electrode slurry, electrode, and electrical storage device

InventorID:

389417 ⎘