Los Altos, California
United States
10
2010-11-02
The entities that hold a legal rights for patent applications filed by inventor Wack Daniel C.:
Daniel C. Wack from Los Altos, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for optimizing the configuration of a scatterometry measurement system
#2 | 2010-05-11Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction
#3 | 2009-08-06System for scatterometric measurements and applications
#4 | 2009-07-30SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DIFFRACTING STRUCTURE
#5 | 2009-05-28Parametric profiling using optical spectroscopic systems
#6 | 2008-04-10System for scatterometric measurements and applications
#7 | 2008-02-14System for measuring a sample with a layer containing a periodic diffracting structure
#8 | 2007-10-09Parametric profiling using optical spectroscopic systems
#9 | 2006-08-29System for scatterometric measurements and applications
#10 | 2005-12-15System for scatterometric measurements and applications
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