Edward P. Hammond, IV

City:

Country:

United States

Published Applications:

Last publication date:

2009-06-18

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Edward P. Hammond, IV from , US has applied for patents for these inventions. The list has both pending applications and granted patents:

Method of controlling CD bias and CD microloading by changing the ceiling-to-wafer gap in a plasma reactor

Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process

InventorID:

3960059 ⎘