Tokyo
Japan
51
2024-05-16
The entities that hold a legal rights for patent applications filed by inventor Ito Kenya:
Kenya Ito from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
DETERMINATION DEVICE, LEARNING DEVICE, DETERMINATION SYSTEM, DETERMINATION METHOD, LEARNING METHOD, AND PROGRAM
#2 | 2023-10-05TAPE STICKING SYSTEM, TAPE STICKING METHOD, TAPE PEELING SYSTEM, AND TAPE PEELING METHOD
#3 | 2019-12-12Treatment device, plating apparatus including the same, conveying device, and treatment method
#4 | 2019-08-29Chemical mechanical polishing apparatus for polishing workpiece
#5 | 2019-08-29Substrate processing apparatus and substrate processing method
#6 | 2019-08-29Substrate processing apparatus and substrate processing method
#7 | 2019-02-21Method and apparatus for polishing a substrate, and method for processing a substrate
#8 | 2018-09-06Polishing method, polishing apparatus, and substrate processing system
#9 | 2018-06-21Polishing apparatus and polishing method
#10 | 2018-03-15Substrate processing method and substrate processing apparatus
#11 | 2017-11-02CHEMICAL MECHANICAL POLISHING APPARATUS FOR POLISHING WORKPIECE
#12 | 2016-11-03Abrasive film fabrication method and abrasive film
#13 | 2016-06-16SUBSTRATE PROCESSING APPARATUS
#14 | 2016-02-25Polishing method
#15 | 2016-01-28Tape sticking apparatus and tape sticking method
#16 | 2015-09-17Polishing apparatus and polishing method
#17 | 2015-04-16Substrate processing apparatus and substrate processing method
#18 | 2015-04-16Substrate peripheral portion measuring device, and substrate peripheral portion polishing apparatus
#19 | 2015-01-01Substrate processing apparatus
#20 | 2015-01-01Substrate processing apparatus
#21 | 2014-08-07Method of polishing back surface of substrate and substrate processing apparatus
#22 | 2014-01-30Abrasive film fabrication method and abrasive film
#23 | 2014-01-02Polishing pad and chemical mechanical polishing apparatus for polishing a workpiece, and method of polishing a workpiece using the chemical mechanical polishing apparatus
#24 | 2013-09-12Method for manufacturing semiconductor device
#25 | 2013-08-22Substrate processing apparatus and substrate processing method
#26 | 2011-10-20POLISHING METHOD
#27 | 2011-09-29Polishing apparatus, polishing method and pressing member for pressing a polishing tool
#28 | 2011-09-08Polishing apparatus and polishing method
#29 | 2011-08-25Method for manufacturing semiconductor device
#30 | 2011-07-07Polishing apparatus
#31 | 2011-01-06POLISHING APPARATUS
#32 | 2011-01-06Polishing apparatus and polishing method
#33 | 2010-10-07SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#34 | 2010-07-15POLISHING APPARATUS AND POLISHING METHOD
#35 | 2010-06-03Polishing apparatus and substrate processing apparatus
#36 | 2009-12-31Polishing apparatus, polishing method, and processing apparatus
#37 | 2009-05-07Polishing apparatus and substrate processing apparatus
#38 | 2009-04-09Device for polishing peripheral edge of semiconductor wafer
#39 | 2009-04-09Substrate processing apparatus and substrate processing method
#40 | 2009-01-15SUBSTRATE PROCESSING APPARATUS
#41 | 2009-01-15Polishing apparatus and polishing method
#42 | 2009-01-01Polishing apparatus and polishing method
#43 | 2008-11-06Substrate Peripheral Portion Measuring Device, and Substrate Peripheral Portion Polishing Apparatus
#44 | 2008-08-21Substrate processing apparatus
#45 | 2008-01-24Apparatus for cleaning a substrate having metal interconnects
#46 | 2007-12-13Substrate processing method and substrate processing apparatus
#47 | 2006-10-19Substrate processing apparatus, substrate processing method, and substrate holding apparatus
#48 | 2006-01-26Substrate processing method and substrate processing apparatus
#49 | 2005-11-03Substrate processing apparatus
#50 | 2005-08-23Substrate processing apparatus
#51 | 2005-05-05Substrate processing apparatus and substrate processing method
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