Michael Sebald

Method for structuring a substrate using a metal mask layer formed using a galvanization process

Method of forming a patterned resist layer for patterning a semiconductor product

Resist for electron beam lithography and a process for producing photomasks using electron beam lithography

Lithographic process for reducing the lateral chromium structure loss in photomask production using chemically amplified resists

Method and apparatus for a post exposure bake of a resist

Resist for photolithography having reactive groups for subsequent modification of the resist structures

Silicon-containing resist for photolithography

Method for forming a lithography mask

Process for silylating photoresists in the UV range

Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography

Process for the production of photomasks for structuring semiconductor substrates by optical lithography

Process for producing hard masks

Silicon resist for photolithography at short exposure wavelengths and process for making photoresists

Negative resist process with simultaneous development and aromatization of resist structures

Process for modifying resist structures and resist films from the aqueous phase

Apparatus and method for verification of outgassing products

Process for sidewall amplification of resist structures and for the production of structures having reduced structure size

Apparatus and method for proof of outgassing products

Method for structuring a photoresist layer

Photoresist compound and method for structuring a photoresist layer