Inventor profile of:

Todd C. Bailey

City:

Fishkill, New York

Country:

United States

Published Applications:

14

Last publication date:

2010-07-08

Top Assignees for applications by Todd C. Bailey

The entities that hold a legal rights for patent applications filed by inventor Bailey Todd C.:

Recent patent applications by Bailey Todd C.

Todd C. Bailey from Fishkill, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2010-07-08
US20100173033A1
Physics

Device for holding a template for use in imprint lithography

#2 | 2010-05-04
US10747737
-

Device for holding a template for use in imprint lithography

#3 | 2009-11-19
US20090284726A1
Physics

Stray light feedback for dose control in semiconductor lithography systems

#4 | 2009-08-27
US20090214689A1
Performing operations; transporting

Imprint Lithography Templates Having Alignment Marks

#5 | 2008-08-21
US20080199816A1
Physics

Method of automatic fluid dispensing for imprint lithography processes

#6 | 2007-11-15
US20070264588A1
Performing operations; transporting

Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks

#7 | 2007-06-12
US10755997
-

Imprint lithography template having a feature size under 250 nm

#8 | 2007-03-06
US10805916
-

Method of determining alignment of a template and a substrate having a liquid disposed therebetween

#9 | 2006-09-07
US20060199369A1
Electricity

Ribs for line collapse prevention in damascene structures

#10 | 2006-08-01
US11160744
-

Method for performing chemical shrink process over BARC (bottom anti-reflective coating)

#11 | 2006-07-13
US20060153118A1
Electricity

SYSTEM AND METHOD FOR WIRELESS IP ADDRESS CAPACITY OPTIMIZATION

#12 | 2006-07-06
US20060145398A1
Performing operations; transporting

Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks

#13 | 2006-05-25
US20060110666A1
Physics

Stray light feedback for dose control in semiconductor lithography systems

#14 | 2005-03-24
US20050064344A1
Performing operations; transporting

Imprint lithography templates having alignment marks

InventorID:

4012832 ⎘