Fishkill, New York
United States
14
2010-07-08
The entities that hold a legal rights for patent applications filed by inventor Bailey Todd C.:
Todd C. Bailey from Fishkill, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Device for holding a template for use in imprint lithography
#2 | 2010-05-04Device for holding a template for use in imprint lithography
#3 | 2009-11-19Stray light feedback for dose control in semiconductor lithography systems
#4 | 2009-08-27Imprint Lithography Templates Having Alignment Marks
#5 | 2008-08-21Method of automatic fluid dispensing for imprint lithography processes
#6 | 2007-11-15Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
#7 | 2007-06-12Imprint lithography template having a feature size under 250 nm
#8 | 2007-03-06Method of determining alignment of a template and a substrate having a liquid disposed therebetween
#9 | 2006-09-07Ribs for line collapse prevention in damascene structures
#10 | 2006-08-01Method for performing chemical shrink process over BARC (bottom anti-reflective coating)
#11 | 2006-07-13SYSTEM AND METHOD FOR WIRELESS IP ADDRESS CAPACITY OPTIMIZATION
#12 | 2006-07-06Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
#13 | 2006-05-25Stray light feedback for dose control in semiconductor lithography systems
#14 | 2005-03-24Imprint lithography templates having alignment marks
4012832 ⎘