Jochen Beintner

Method of making double-gated self-aligned finFET having gates of different lengths

Dense chevron finFET and method of manufacturing same

Structure and method of making double-gated self-aligned finFET having gates of different lengths

Dense chevron finFET and method of manufacturing same

TEOS assisted oxide CMP process

Raised STI process for multiple gate ox and sidewall protection on strained Si/SGOI sructure with elevated source/drain

Gate conductor isolation and method for manufacturing same

Method of implanting using a shadow effect

Method of forming a collar using selective SiGe/Amorphous Si Etch

Raised STI process for multiple gate ox and sidewall protection on strained Si/SGOI structure with elevated source/drain

Nitrogen implantation using a shadow effect to control gate oxide thickness in DRAM semiconductor

Pitcher-shaped active area for field effect transistor and method of forming same

Self-aligned buried strap process using doped HDP oxide

Trench capacitor with buried strap

Structure and method of forming a notched gate field effect transistor

Nitrided STI liner oxide for reduced corner device impact on vertical device performance

Structure and method for ultra-small grain size polysilicon

Structure and method of forming a notched gate field effect transistor

Dual gate FinFet

Process integration for integrated circuits

Trench isolation employing a high aspect ratio trench