Jena
Germany
14
2008-03-20
The entities that hold a legal rights for patent applications filed by inventor Gaebel Kai:
Kai Gaebel from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency and minimum contamination
#2 | 2006-10-17Arrangement for the stabilization of the radiation emission of a plasma
#3 | 2006-10-12Collector mirror for plasma-based, short-wavelength radiation sources
#4 | 2006-10-12Plasma radiation source
#5 | 2006-10-05Radiation source for the generation of short-wavelength radiation
#6 | 2006-08-31Device and method for generating extreme ultraviolet (EUV) radiation
#7 | 2006-06-29Arrangement for the generation of a pulsed laser beam of high average output
#8 | 2006-03-02Arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength electromagnetic radiation
#9 | 2006-02-07Arrangement for the generation of intensive short-wave radiation based on a plasma
#10 | 2006-02-02Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation
#11 | 2005-12-15Apparatus for the temporally stable generation of EUV radiation by means of a laser-induced plasma
#12 | 2005-11-24Method and arrangement for the plasma-based generation of intensive short-wavelength radiation
#13 | 2005-08-04Method and arrangement for the plasma-based generation of soft x-radiation
#14 | 2005-04-19Radiation source for generating extreme ultraviolet radiation
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