Suwon-si
South Korea
10
2008-12-11
The entities that hold a legal rights for patent applications filed by inventor Hata Mitsuhiro:
Mitsuhiro Hata from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
Coating compositions for use in forming patterns and methods of forming patterns
#2 | 2008-05-15Coating Compositions for Use in Forming Patterns and Methods of Forming Patterns
#3 | 2008-03-27Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device
#4 | 2007-03-01Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same
#5 | 2007-03-01Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions
#6 | 2007-03-01Coating compositions for use in forming patterns and methods of forming patterns
#7 | 2007-02-15Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same
#8 | 2006-05-25Bottom layer resist polymers for photolithography and methods of manufacturing the same
#9 | 2005-10-13Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
#10 | 2005-10-13Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
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