Sunol, California
United States
58
2026-04-16
The entities that hold a legal rights for patent applications filed by inventor Xu Kun:
Kun Xu from Sunol, US has applied for patents for these inventions. The list has both pending applications and granted patents:
COMPENSATION FOR SLURRY COMPOSITION IN IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING
#2 | 2026-03-05USING SIGNAL MINIMA IN EDDY CURRENT MONITORING
#3 | 2026-03-05PLATEN WITH MULTIPLE SENSORS FOR EDDY CURRENT MONITORING
#4 | 2026-01-15COMPENSATION FOR SUBSTRATE DOPING IN EDGE RECONSTRUCTION FOR IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING
#5 | 2026-01-08POLISHING APPARATUS USING NEURAL NETWORK FOR MONITORING
#6 | 2025-10-23EDDY CURRENT MONITORING TO DETECT VIBRATION IN POLISHING
#7 | 2025-08-21GENERATION OF BACKGROUND SIGNAL SEQUENCE USING AN IN-SITU MONITORING SYSTEM IN CHEMICAL MECHANICAL POLISHING
#8 | 2025-08-21PROCESSING OF SIGNALS FROM AN IN-SITU MONITORING SYSTEM IN CHEMICAL MECHANICAL POLISHING
#9 | 2025-08-21PROCESSING OF SCALED SIGNALS FROM IN-SITU MONITORING SYSTEM IN CHEMICAL MECHANICAL POLISHING
#10 | 2025-08-21PROCESSING OF SIGNALS FROM IN-SITU MONITORING SYSTEM IN CHEMICAL MECHANICAL POLISHING
#11 | 2025-08-14Generation of Starting Thickness Profile Using In-SITU Monitoring System
#12 | 2025-08-14MULTI-ZONE PROFILE CONTROL FOR INCONSISTENT UNDERLAYER
#13 | 2025-08-14ENDPOINT CONTROL FOR INCONSISTENT UNDERLAYER
#14 | 2024-04-18COMPENSATION FOR SLURRY COMPOSITION IN IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING
#15 | 2024-04-11SWITCHING CONTROL ALGORITHMS ON DETECTION OF EXPOSURE OF UNDERLYING LAYER DURING POLISHING
#16 | 2024-01-11Technique for training neural network for use in in-situ monitoring during polishing and polishing system
#17 | 2023-12-07ACOUSTIC MONITORING OF CMP RETAINING RING
#18 | 2023-11-30Determination of substrate layer thickness with polishing pad wear compensation
#19 | 2023-09-14Trained neural network in in-situ monitoring during polishing and polishing system
#20 | 2023-09-14EDDY CURRENT MONITORING TO DETECT VIBRATION IN POLISHING
#21 | 2023-07-06Core configuration for in-situ electromagnetic induction monitoring system
#22 | 2023-03-23POLISHING APPARATUS USING MACHINE LEARNING AND COMPENSATION FOR PAD THICKNESS
#23 | 2022-06-16Compensation for slurry composition in in-situ electromagnetic inductive monitoring
#24 | 2022-02-10Resistivity-based adjustment of thresholds for in-situ monitoring
#25 | 2021-12-30Determination of substrate layer thickness with polishing pad wear compensation
#26 | 2021-12-09Switching control algorithms on detection of exposure of underlying layer during polishing
#27 | 2021-12-09COMPENSATION FOR SUBSTRATE DOPING IN EDGE RECONSTRUCTION FOR IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING
#28 | 2021-12-09Profile control with multiple instances of contol algorithm during polishing
#29 | 2021-12-09PROFILE CONTROL DURING POLISHING OF A STACK OF ADJACENT CONDUCTIVE LAYERS
#30 | 2021-11-18Using a trained neural network for use in in-situ monitoring during polishing and polishing system
#31 | 2021-11-18Technique for training neural network for use in in-situ monitoring during polishing and polishing system
#32 | 2021-07-29POLISHING APPARATUS USING NEURAL NETWORK FOR MONITORING
#33 | 2019-12-26METHODS, APPARATUSES AND SYSTEMS FOR CONDUCTIVE FILM LAYER THICKNESS MEASUREMENTS
#34 | 2019-12-26Compensation for substrate doping for in-situ electromagnetic inductive monitoring
#35 | 2019-11-28Core configuration for in-situ electromagnetic induction monitoring system
#36 | 2019-10-03Polishing apparatus using machine learning and compensation for pad thickness
#37 | 2019-05-09Determination of gain for eddy current sensor
#38 | 2019-03-21Chattering correction for accurate sensor position determination on wafer
#39 | 2018-10-25Polishing apparatus using neural network for monitoring
#40 | 2018-07-19Resistivity-based calibration of in-situ electromagnetic inductive monitoring
#41 | 2018-07-19Resistivity-based adjustment of measurements from in-situ monitoring
#42 | 2018-05-03Core configuration with alternating posts for in-situ electromagnetic induction monitoring system
#43 | 2018-04-26Core configuration for in-situ electromagnetic induction monitoring system
#44 | 2018-04-12Real time profile control for chemical mechanical polishing
#45 | 2018-03-22Endpoint detection with compensation for filtering
#46 | 2016-06-09Determination of gain for eddy current sensor
#47 | 2015-08-13Adjusting eddy current measurements
#48 | 2015-04-30Determination of gain for eddy current sensor
#49 | 2015-04-30Determination of gain for eddy current sensor
#50 | 2014-05-08In-situ monitoring system with monitoring of elongated region
#51 | 2013-08-29Feedback control using detection of clearance and adjustment for uniform topography
#52 | 2012-11-01EDDY CURRENT MONITORING OF METAL RESIDUE OR METAL PILLARS
#53 | 2012-11-01EDDY CURRENT MONITORING OF METAL FEATURES
#54 | 2012-11-01High sensitivity eddy current monitoring system
#55 | 2012-03-15Feedback control of polishing using optical detection of clearance
#56 | 2011-08-04High Sensitivity Real Time Profile Control Eddy Current Monitoring System
#57 | 2011-08-04High Sensitivity Real Time Profile Control Eddy Current Monitoring System
#58 | 2010-11-04TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING
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