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Inventor profile of:

Mitsuhiro Okada

City:

Kai-shi

Country:

Japan

Published Applications:

6

Last publication date:

2008-11-06

Top Assignees for applications by Mitsuhiro Okada

The entities that hold a legal rights for patent applications filed by inventor Okada Mitsuhiro:

  • TOKYO ELECTRON LIMITED 5 Tokyo, Japan

Recent patent applications by Okada Mitsuhiro

Mitsuhiro Okada from Kai-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2008-11-06
US20080274302A1
Chemistry; metallurgy

Film formation method and apparatus for semiconductor process

#2 | 2007-05-24
US20070117398A1
Electricity

Film formation apparatus and method of using the same

#3 | 2007-02-08
US20070032047A1
Chemistry; metallurgy

Method and apparatus for forming silicon-containing insulating film

#4 | 2006-09-21
US20060207504A1
Chemistry; metallurgy

Film formation method and apparatus for semiconductor process

#5 | 2006-03-30
US20060068606A1
Electricity

Method and apparatus for forming silicon nitride film

#6 | 2006-02-16
US20060032443A1
Chemistry; metallurgy

Film formation method and apparatus for semiconductor process for forming a silicon nitride film

InventorID:

4288244 ⎘

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