Ajay Kumar

Method for removal of metallic residue after plasma etching of a metal layer

Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another

Method of plasma etching high-K dielectric materials with high selectivity to underlying layers

Method of plasma etching of high-K dielectric materials

Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor

Method of etching a magnetic material

Method of plasma etching of high-K dielectric materials

Method of etching metals with high selectivity to hafnium-based dielectric materials

Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor

Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer

Etching multi-shaped openings in silicon

Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask

Methods for forming thermo-optic switches, routers and attenuators

Method of etching magnetic and ferroelectric materials using a pulsed bias source

Method of etching ferroelectric layers

Method for removing conductive residue

Method for fabricating a notched gate structure of a field effect transistor

Method of etching a magnetic material

Method of releasing devices from a substrate

Method for plasma etching of high-K dielectric materials

Method for etching high-aspect-ratio features

Method of preventing short circuits in magnetic film stacks

Method for fabricating a gate structure

Method of fabricating a magneto-resistive random access memory (MRAM) device