Allen John Leith

Sequential oxide removal using fluorine and hydrogen

Interrupted deposition process for selective deposition of Si-containing films

Sequential deposition process for forming Si-containing films

Low temperature formation of patterned epitaxial Si containing films

Low-temperature oxide removal using fluorine

Method and system for removing an oxide from a substrate

Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor

Deposition of silicon-containing films from hexachlorodisilane