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Inventor profile of:

Satoshi Ebata

City:

Tokyo

Country:

Japan

Published Applications:

7

Last publication date:

2007-07-05

Top Assignees for applications by Satoshi Ebata

The entities that hold a legal rights for patent applications filed by inventor Ebata Satoshi:

  • JSR Corporation 7 Tokyo, Japan
  • JRS Corporation 1 Tokyo, Japan
  • JSR CORPORATION 1 Chuo-ku, Japan

Recent patent applications by Ebata Satoshi

Satoshi Ebata from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2007-07-05
US20070155922A1
Chemistry; metallurgy

Process for producing cycloolefin addition polymer

#2 | 2007-05-31
US20070123667A1
Chemistry; metallurgy

Process for producing cycloolefin addition polymer

#3 | 2007-03-08
US20070054214A1
Chemistry; metallurgy

Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions

#4 | 2006-09-28
US20060217505A1
Chemistry; metallurgy

Process for producing cycloolefin addition polymer

#5 | 2006-06-29
US20060141383A1
Chemistry; metallurgy

Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition

#6 | 2005-06-21
US10183441
-

Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition

#7 | 2005-04-05
US10168104
-

Ruthenium film, ruthenium oxide film and process for forming the same

InventorID:

4370258 ⎘

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