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Inventor profile of:

Eiichi Nishimura

City:

Nirasaki-shi

Country:

Japan

Published Applications:

Last publication date:

2015-05-14

Top Assignees for applications by Eiichi Nishimura

The entities that hold a legal rights for patent applications filed by inventor Nishimura Eiichi:

TOKYO ELECTRON LIMITED 36 Tokyo, Japan
TOKYO ELECTRON LIMITED 11 Minato-ku, Japan
Kabushiki Kaisha Toshiba 2 Tokyo, Japan
OSAKA UNIVERSITY 2 Suita-shi, Japan
TOKYO ELECTON LIMITED 2 Tokyo, Japan
EMD CORPORATION 1 KYOTO-SHI, KYOTO, Japan
Tokyo Electron Limited 1 , Japan
TOHOKU UNIVERSITY 1 Miyagi, Japan
TOYOTA ELECTRON LIMITED 1 Tokyo, Japan

Recent patent applications by Nishimura Eiichi

Eiichi Nishimura from Nirasaki-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-05-14

US20150132960A1

Electricity

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

#2 | 2013-09-19

US20130240479A1

Performing operations; transporting

METHOD FOR PRODUCING FILTRATION FILTER

#3 | 2012-08-02

US20120196387A1

Electricity

Substrate processing method

#4 | 2012-02-09

US20120031563A1

Electricity

PLASMA PROCESSING DEVICE

#5 | 2012-01-12

US20120009786A1

Electricity

Plasma processing method and manufacturing method of semiconductor device

#6 | 2011-12-15

US20110303642A1

Electricity

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

#7 | 2011-07-14

US20110168205A1

Electricity

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS

#8 | 2011-02-10

US20110033636A1

Electricity

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING PROGRAM FOR IMPLEMENTING THE METHOD

#9 | 2010-08-19

US20100206846A1

Electricity

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

#10 | 2010-07-08

US20100170871A1

Electricity

Fine pattern forming method

#11 | 2010-05-27

US20100130011A1

Electricity

Semiconductor device fabrication method

#12 | 2010-02-18

US20100040980A1

Physics

METHOD AND APPARATUS FOR REFORMING FILM AND CONTROLLING SLIMMING AMOUNT THEREOF

#13 | 2010-02-04

US20100029086A1

Electricity

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND STORAGE MEDIUM

#14 | 2010-01-28

US20100018332A1

Physics

Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium

#15 | 2009-11-05

US20090275201A1

Electricity

Substrate processing system

#16 | 2009-08-20

US20090209108A1

Electricity

SUBSTRATE PROCESSING METHOD

#17 | 2009-04-02

US20090087991A1

Electricity

Manufacturing method, manufacturing apparatus, control program and program recording medium of semicontructor device

#18 | 2009-04-02

US20090087990A1

Electricity

Manufacturing method, manufacturing apparatus, control program and program recording medium of semiconductor device

#19 | 2009-01-15

US20090014125A1

Electricity

Substrate processing system and method

#20 | 2009-01-08

US20090011605A1

Electricity

Method of manufacturing semiconductor device

#21 | 2008-12-11

US20080305632A1

Electricity

Substrate processing apparatus, substrate processing method and storage medium

#22 | 2008-10-02

US20080236634A1

Electricity

Substrate processing system and substrate cleaning apparatus including a jetting apparatus

#23 | 2008-09-25

US20080233766A1

Electricity

Ashing method and apparatus therefor

#24 | 2008-09-25

US20080233754A1

Electricity

SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHERAL FILM-REMOVING METHOD

#25 | 2008-09-04

US20080210379A1

Electricity

Substrate processing apparatus and focus ring

#26 | 2008-07-31

US20080182421A1

Electricity

Substrate processing method and substrate processing apparatus

#27 | 2008-07-31

US20080179292A1

Electricity

Substrate processing method and substrate processing apparatus

#28 | 2008-06-19

US20080141509A1

Electricity

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

#29 | 2008-05-29

US20080124936A1

Electricity

Manufacturing method of capacitor electrode, manufacturing system of capacitor electrode, and storage medium

#30 | 2008-01-03

US20080003836A1

Electricity

Substrate processing method and substrate processing apparatus

#31 | 2008-01-03

US20080003365A1

Electricity

Substrate processing method and substrate processing apparatus

#32 | 2007-11-29

US20070275560A1

Physics

Method of manufacturing semiconductor device

#33 | 2007-09-27

US20070224818A1

Electricity

Substrate processing method and storage medium

#34 | 2007-09-13

US20070212816A1

Electricity

SUBSTRATE PROCESSING SYSTEM

#35 | 2007-09-13

US20070211402A1

Electricity

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE ATTRACTING METHOD, AND STORAGE MEDIUM

#36 | 2007-08-02

US20070175393A1

Electricity

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING PROGRAM FOR IMPLEMENTING THE METHOD

#37 | 2007-06-21

US20070141843A1

Electricity

SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHERAL FILM-REMOVING METHOD

#38 | 2006-10-05

US20060219660A1

Electricity

Etching method

#39 | 2006-10-05

US20060219171A1

Electricity

Substrate processing apparatus

#40 | 2006-09-07

US20060196527A1

Electricity

Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods

#41 | 2006-08-31

US20060194435A1

Electricity

Method of processing substrate, and method of and program for manufacturing electronic device

#42 | 2006-08-31

US20060191865A1

Electricity

Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods

#43 | 2006-08-24

US20060189138A1

Electricity

Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device

#44 | 2005-09-29

US20050214683A1

Physics

Method and apparatus for reforming film and controlling slimming amount thereof

InventorID:

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