Phoenix, Arizona
United States
22
2007-08-16
The entities that hold a legal rights for patent applications filed by inventor Mitrovic Andrej S.:
Andrej S. Mitrovic from Phoenix, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and system for monitoring component consumption
#2 | 2007-06-14Plasma chamber wall segment temperature control
#3 | 2007-05-24Plasma chamber wall segment temperature control
#4 | 2007-05-24Plasma chamber wall segment temperature control
#5 | 2007-04-24Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuck
#6 | 2007-03-06Plasma chamber wall segment temperature control
#7 | 2007-01-16Method and apparatus for improved plasma processing uniformity
#8 | 2006-08-31Chuck pedestal shield
#9 | 2006-03-23Plasma processing system and method
#10 | 2005-11-08Controlled method for segmented electrode apparatus and method for plasma processing
#11 | 2005-10-25Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy
#12 | 2005-10-13Honeycomb optical window deposition shield and method for a plasma processing system
#13 | 2005-10-06Low reflection microwave window
#14 | 2005-08-11Apparatus and method for use of optical system with a plasma processing system
#15 | 2005-08-04Method and system for monitoring component consumption
#16 | 2005-07-12Addition of power at selected harmonics of plasma processor drive frequency
#17 | 2005-05-31Closed-drift hall effect plasma vacuum pump for process reactors
#18 | 2005-03-31System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process
#19 | 2005-03-31System and method for using first-principles simulation to characterize a semiconductor manufacturing process
#20 | 2005-03-31System and method for using first-principles simulation to facilitate a semiconductor manufacturing process
#21 | 2005-03-31Method and apparatus for determining plasma impedance
#22 | 2005-03-08Segmented electrode apparatus for plasma processing
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