Daniel MATEJA

City:

Oswego, Illinois

Country:

United States

Published Applications:

Last publication date:

2015-06-11

Top Assignees for applications by Daniel MATEJA

The entities that hold a legal rights for patent applications filed by inventor MATEJA Daniel:

Daniel MATEJA from Oswego, US has applied for patents for these inventions. The list has both pending applications and granted patents:

CMP compositions and methods for selective removal of silicon nitride

Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials

CMP compositions selective for oxide and nitride with high removal rate and low defectivity

InventorID:

444843 ⎘