Pixbo
Sweden
84
2021-11-04
The entities that hold a legal rights for patent applications filed by inventor Sandstrom Torbjorn:
Torbjorn Sandstrom from Pixbo, SE has applied for patents for these inventions. The list has both pending applications and granted patents:
Recurring process for laser induced forward transfer and high throughput and recycling of donor material by the reuse of a plurality of target substrate plates or forward transfer of a pattern of discrete donor dots
#2 | 2018-09-13COMPOSITION OF SOLID-CONTAINING PASTE
#3 | 2018-01-18Recurring process for laser induced forward transfer and high throughput and recycling of donor material by the reuse of a plurality of target substrate plates or forward transfer of a pattern of discrete donor dots
#4 | 2014-09-18Method and device for writing photomasks with reduced mura errors
#5 | 2014-09-18Mechanically produced alignment fiducial method and device
#6 | 2014-02-20LITHOGRAPHIC PRINTING SYSTEM WITH PLACEMENT CORRECTIONS
#7 | 2013-12-19Optical writer for flexible foils
#8 | 2013-09-26Method and device using rotating printing arm to project or view image across a workpiece
#9 | 2012-12-06Criss-cross writing strategy
#10 | 2012-11-08Method and device scanning a two-dimensional brush through an acousto-optic deflector (AOD) having an extended field in a scanning direction
#11 | 2012-11-08Multi-method and device with an advanced acousto-optic deflector (AOD) and a dense brush of flying spots
#12 | 2012-08-30Acousto-optic deflectors over one octave
#13 | 2011-10-061.5D SLM for lithography
#14 | 2011-10-06Methods and device for laser processing
#15 | 2010-12-09Writing apparatuses and methods
#16 | 2010-09-09Variable overlap method and device for stitching together lithographic stripes
#17 | 2010-09-09Oversized micro-mechanical light modulator with redundant elements, device and method
#18 | 2010-09-09Rotor imaging system and method with variable-rate pixel clock
#19 | 2010-09-09Lithographic printing system with placement corrections
#20 | 2010-09-09Rotor optics imaging method and system with variable dose during sweep
#21 | 2010-09-09Statistical Illuminator
#22 | 2010-08-19SLM device and method combining multiple mirrors for high-power delivery
#23 | 2010-08-19Pattern generator
#24 | 2010-06-10Method and device using rotating printing arm to project or view image across a workpiece
#25 | 2010-05-27Image reading and writing using a complex two-dimensional interlace scheme
#26 | 2010-04-22Multi-focus method of enhanced three-dimensional exposure of resist
#27 | 2010-04-22Method of iterative compensation for non-linear effects in three-dimensional exposure of resist
#28 | 2010-04-22Method of compensation for bleaching of resist during three-dimensional exposure of resist
#29 | 2009-12-10Spatial light modulator with structured mirror surfaces
#30 | 2009-09-15Data path for high performance pattern generator
#31 | 2009-08-27METHOD AND APPARATUS FOR PROJECTION PRINTING
#32 | 2009-07-30Pattern generator
#33 | 2009-06-11Pattern generator
#34 | 2009-04-23Method for error reduction in lithography
#35 | 2009-03-12Image forming method and apparatus
#36 | 2009-01-29Method and apparatus for mura detection and metrology
#37 | 2008-12-25Method and apparatus for quantification of illumination non-uniformity in the mask plane of a lithographic exposure system
#38 | 2008-10-28Method for error reduction in lithography
#39 | 2008-10-02METHOD AND DEVICE FOR DATA INTEGRITY CHECKING
#40 | 2008-06-05Dual layer workpiece masking and manufacturing process
#41 | 2008-05-29Method and device for correcting SLM stamp image imperfections
#42 | 2008-04-03Graphics engine for high precision lithography
#43 | 2008-04-03Pattern generator
#44 | 2008-03-27Graphics engine for high precision lithography
#45 | 2008-03-13Method and apparatus for personalization of semiconductor
#46 | 2008-02-07Platforms, apparatuses, systems and methods for processing and analyzing substrates
#47 | 2007-12-06SLM STRUCTURE COMPRISING SEMICONDUCTING MATERIAL
#48 | 2007-11-27Graphics engine for high precision lithography
#49 | 2007-11-22METHOD AND PROCESS FOR IMMERSION EXPOSURE OF A SUBSTRATE
#50 | 2007-11-01Method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample
#51 | 2007-09-06SLM lithography: printing to below K1=.30 without previous OPC processing
#52 | 2007-09-06Image forming method and apparatus
#53 | 2007-08-16Writing apparatuses and methods
#54 | 2007-08-09Method and apparatus for printing patterns with improved cd uniformity
#55 | 2007-08-09Writing apparatuses and methods
#56 | 2007-07-19Method for high precision printing of patterns
#57 | 2007-05-10Dual layer workpiece masking and manufacturing process
#58 | 2006-12-26Dual layer workpiece masking and manufacturing process
#59 | 2006-09-12Methods and systems for improved boundary contrast
#60 | 2006-08-24Pattern generator diffractive mirror methods and systems
#61 | 2006-07-20Method and apparatus for personalization of semiconductor
#62 | 2006-05-18Pattern generator
#63 | 2006-04-13Methods and systems for improved boundary contrast
#64 | 2006-03-30Phase-shifting optical maskless lithography enabling asics at the 65 and 45 NM nodes
#65 | 2006-03-16Pupil improvement of incoherent imaging systems for enhanced CD linearity
#66 | 2006-03-07Pattern generator
#67 | 2006-02-23Patterning apparatuses and methods for the same
#68 | 2006-01-17Pattern generator mirror configurations
#69 | 2005-12-13Multi-beam pattern generator
#70 | 2005-11-15Method and apparatus of calibrating multi-position SLM elements
#71 | 2005-10-13Pattern generator mirror configurations
#72 | 2005-10-06Mask blank and a method for producing the same
#73 | 2005-10-06RET for optical maskless lithography
#74 | 2005-09-27Alignment sensor
#75 | 2005-08-25Method and device for correcting SLM stamp image imperfections
#76 | 2005-08-11Method and device for data integrity checking
#77 | 2005-08-04Image forming method and apparatus
#78 | 2005-06-30Method and device for coherence reduction
#79 | 2005-06-07Homogenizer
#80 | 2005-05-26Method involving a mask or a reticle
#81 | 2005-05-10High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices
#82 | 2005-04-21Method and apparatus for patterning a workpiece
#83 | 2005-04-19Method for error reduction in lithography
#84 | 2005-03-03Method and apparatus for personalization of semiconductor
453091 ⎘