Ottobrunn
Germany
5
2008-07-01
The entities that hold a legal rights for patent applications filed by inventor Kohle Roderick:
Roderick Kohle from Ottobrunn, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer
#2 | 2006-09-21Lithography mask and methods for producing a lithography mask
#3 | 2006-08-24Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask
#4 | 2006-01-12Method for determining a matrix of transmission cross coefficients in an optical proximity correction of mask layouts
#5 | 2005-05-05Lithography mask for imaging of convex structures
4551980 ⎘