Inventor profile of:

Anthony Dip

City:

Austin, Texas

Country:

United States

Published Applications:

16

Last publication date:

2026-05-28

Top Assignees for applications by Anthony Dip

The entities that hold a legal rights for patent applications filed by inventor Dip Anthony:

Recent patent applications by Dip Anthony

Anthony Dip from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-28
US20260146329A1
Chemistry; metallurgy

SEMICONDUCTOR PROCESSING SYSTEMS, CHEMICAL VAPOR DEPOSITION (CVD) REACTORS AND METHODS FOR DEPOSITING MATERIAL ON SEMICONDUCTOR SUBSTRATES WITH UNIFORM TEMPERATURE AND GAS FLOW ACROSS THE SUBSTRATE SURFACE

#2 | 2026-05-28
US20260146326A1
Chemistry; metallurgy

SEMICONDUCTOR PROCESSING SYSTEMS, CHEMICAL VAPOR DEPOSITION (CVD) REACTORS AND METHODS FOR DEPOSITING MATERIAL ON SEMICONDUCTOR SUBSTRATES WITH UNIFORM TEMPERATURE AND GAS FLOW ACROSS THE SUBSTRATE SURFACE

#3 | 2024-11-14
US20240376602A1
Chemistry; metallurgy

Deposition Systems with Rotating Electrostatic Chuck and Methods Thereof

#4 | 2024-02-08
US20240047218A1
Electricity

SYSTEMS AND METHODS FOR IMPROVING PLANARITY USING SELECTIVE ATOMIC LAYER ETCHING (ALE)

#5 | 2022-06-09
US20220178024A1
Chemistry; metallurgy

FURNACE WITH METAL FURNACE TUBE

#6 | 2022-02-10
US20220044974A1
Electricity

Gas phase production of radicals for dielectrics

#7 | 2022-02-03
US20220037162A1
Electricity

Systems and methods for improving planarity using selective atomic layer etching (ALE)

#8 | 2021-11-18
US20210355580A1
Chemistry; metallurgy

Systems and Methods for Depositing a Layer on a Substrate Using Atomic Oxygen

#9 | 2021-08-05
US20210242020A1
Electricity

Multiple patterning processes

#10 | 2021-05-27
US20210156029A1
Chemistry; metallurgy

Internally cooled multi-hole injectors for delivery of process chemicals

#11 | 2013-09-26
US20130251904A1
Chemistry; metallurgy

FILM DEPOSITION METHOD AND COMPUTER READABLE STORAGE MEDIUM

#12 | 2011-06-23
US20110151122A1
Chemistry; metallurgy

Film deposition apparatus

#13 | 2009-12-31
US20090324828A1
Chemistry; metallurgy

Film deposition apparatus

#14 | 2009-12-31
US20090324826A1
Chemistry; metallurgy

Film Deposition Apparatus, Film Deposition Method, and Computer Readable Storage Medium

#15 | 2006-11-28
US10473248
-

Heat treating device

#16 | 2005-03-17
US20050056219A1
Chemistry; metallurgy

Formation of a metal-containing film by sequential gas exposure in a batch type processing system

InventorID:

455508 ⎘