Mountain View, California
United States
18
2017-01-26
The entities that hold a legal rights for patent applications filed by inventor Bork Ingo:
Ingo Bork from Mountain View, US has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY
#2 | 2016-11-17Method and system for forming patterns using charged particle beam lithography
#3 | 2016-07-07Method and system for design of enhanced edge slope patterns for charged particle beam lithography
#4 | 2015-11-26Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography
#5 | 2015-09-17Method and system for forming patterns with charged particle beam lithography
#6 | 2015-04-16Method and system for forming non-manhattan patterns using variable shaped beam lithography
#7 | 2014-08-14Method and system for forming patterns with charged particle beam lithography
#8 | 2014-08-07Method and system for forming high accuracy patterns using charged particle beam lithography
#9 | 2013-11-21Method and system for forming non-manhattan patterns using variable shaped beam lithography
#10 | 2013-10-24Method and system for forming patterns using charged particle beam lithography
#11 | 2013-10-24Method and system for forming patterns using charged particle beam lithography
#12 | 2013-10-24METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY
#13 | 2013-09-26METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY
#14 | 2012-12-27Method and system for forming patterns with charged particle beam lithography
#15 | 2012-11-01METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY
#16 | 2012-08-30Method and system for design of enhanced edge slope patterns for charged particle beam lithography
#17 | 2012-08-30METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY
#18 | 2012-04-19Method and system for forming high accuracy patterns using charged particle beam lithography
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