Jena
Germany
10
2023-10-12
The entities that hold a legal rights for patent applications filed by inventor Pohlmann Ulrich:
Ulrich Pohlmann from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Overlay mark design for electron beam overlay
#2 | 2022-12-29Overlay mark design for electron beam overlay
#3 | 2022-12-29Overlay mark design for electron beam overlay
#4 | 2022-12-29Overlay design for electron beam and scatterometry overlay measurements
#5 | 2021-12-30Performance optimized scanning sequence for eBeam metrology and inspection
#6 | 2020-12-24Multi-stage, multi-zone substrate positioning systems
#7 | 2019-06-13Systems and methods for device-correlated overlay metrology
#8 | 2019-06-13Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals
#9 | 2013-10-03Apparatus and methods for reticle handling in an EUV reticle inspection tool
#10 | 2010-04-08Apparatus and method for the determination of the position of a disk-shaped object
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