Tokyo
Japan
30
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor SUZUKI Junya:
Junya SUZUKI from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
ROTARY ELECTRIC MACHINE
#2 | 2024-10-10INFORMATION PROCESSING DEVICE AND METHOD, AND PROGRAM
#3 | 2024-08-01CIRCUIT CONNECTION DEVICE, ROTATING ELECTRIC DEVICE, AND CIRCUIT CONNECTION DEVICE MANUFACTURING METHOD
#4 | 2024-07-25CIRCUIT CONNECTION DEVICE, ROTATING ELECTRIC MACHINE DEVICE, AND METHOD FOR MANUFACTURING CIRCUIT CONNECTION DEVICE
#5 | 2024-05-16INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND PROGRAM
#6 | 2024-04-18INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND PROGRAM
#7 | 2024-02-22CIRCUIT CONNECTION APPARATUS, ELECTRIC ROTATING MACHINE APPARATUS AND MANUFACTURING METHOD FOR CIRCUIT CONNECTION APPARATUS
#8 | 2024-02-01INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND PROGRAM
#9 | 2023-10-19Rotary electric machine and method of manufacturing rotary electric machine
#10 | 2023-08-17Rotor of rotating electric machine and rotating electric machine
#11 | 2023-08-03ROTATING ELECTRICAL MACHINE AND METHOD FOR MANUFACTURING SAME
#12 | 2023-02-02Electric rotating machine apparatus and electric power steering apparatus
#13 | 2022-09-15INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
#14 | 2022-08-18RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
#15 | 2022-06-30Electric driving device and electric power steering device
#16 | 2022-06-16Driving apparatus and electric power steering apparatus
#17 | 2021-12-16RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
#18 | 2021-11-25RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#19 | 2021-06-10Semiconductor device and method for manufacturing semiconductor device
#20 | 2019-12-05Rotary electric machine having heat sink for semiconductor device of controller
#21 | 2019-05-16Semiconductor device
#22 | 2019-01-24FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD
#23 | 2018-10-11COMPOSITION FOR FORMING SILICON-CONTAINING FILM FOR EUV LITHOGRAPHY, SILICON-CONTAINING FILM FOR EUV LITHOGRAPHY, AND PATTERN-FORMING METHOD
#24 | 2018-01-04Semiconductor device
#25 | 2017-11-16Semiconductor device
#26 | 2017-01-05Pattern-forming method
#27 | 2015-12-10COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND
#28 | 2014-10-09Image pickup apparatus, color correction method, and color correction program
#29 | 2013-10-03Composition for forming resist underlayer film, and pattern-forming method
#30 | 2012-01-12IMAGE PROCESSING DEVICE, IMAGING METHOD, IMAGING PROGRAM, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING PROGRAM
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