Hong Shih

COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACES OF A COMPONENT OF A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS

Method for conditioning silicon part

Systems Comprising Silicon Coated Gas Supply Conduits and Methods for Applying Coatings

USE OF SINTERED NANOGRAINED YTTRIUM-BASED CERAMICS AS ETCH CHAMBER COMPONENTS

USE OF ATOMIC LAYER DEPOSITION COATINGS TO PROTECT BRAZING LINE AGAINST CORROSION, EROSION, AND ARCING

Dense oxide coated component of a plasma processing chamber and method of manufacture thereof

COMPONENT OF A PLASMA PROCESSING APPARATUS INCLUDING AN ELECTRICALLY CONDUCTIVE AND NONMAGNETIC COLD SPRAYED COATING

Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus

Adapter plate for polishing and cleaning electrodes

Electrostatic chuck cleaning fixture

COLD SPRAY BARRIER COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF

Dense oxide coated component of a plasma processing chamber and method of manufacture thereof

Corrosion resistant aluminum coating on plasma chamber components

Portable sonic particle removal tool with a chemically controlled working fluid

Method of wet cleaning aluminum chamber parts

ACTIVELY HEATED ALUMINUM BAFFLE COMPONENT HAVING IMPROVED PARTICLE PERFORMANCE AND METHODS OF USE AND MANUFACTURE THEREOF

PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF

TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING

Method of removing damaged epoxy from electrostatic chuck

Platen and adapter assemblies for facilitating silicon electrode polishing

Dielectric window cleaning apparatuses

Systems Comprising Silicon Coated Gas Supply Conduits And Methods For Applying Coatings

Mixed acid cleaning assemblies

Methods for mixed acid cleaning of showerhead electrodes

COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RESISTANT COATINGS

Automated bubble detection apparatus and method

Bare aluminum baffles for resist stripping chambers

Dual phase cleaning chambers and assemblies comprising the same

On-line chamber cleaning using dry ice blasting

Extending lifetime of yttrium oxide as a plasma chamber material

METHOD OF FORMING A PROCESS CHAMBER COMPONENT HAVING ELECTROPLATED YTTRIUM CONTAINING COATING

Process chamber component having yttrium—aluminum coating

Electrode securing platens and electrode polishing assemblies incorporating the same

Backside mounted electrode carriers and assemblies incorporating the same

Electrode carrier assemblies

Extending storage time of removed plasma chamber components prior to cleaning thereof

Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses

Extending storage time of removed plasma chamber components prior to cleaning thereof

METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA PROCESSING CHAMBERS

Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamber

Bare aluminum baffles for resist stripping chambers

Platen and adapter assemblies for facilitating silicon electrode polishing

Immersive oxidation and etching process for cleaning silicon electrodes

Method for inspecting electrostatic chucks with Kelvin probe analysis

Processes for reconditioning multi-component electrodes

BACKSIDE MOUNTED ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME

Peripherally engaging electrode carriers and assemblies incorporating the same

Method for cleaning microwave applicator tube

Electrode transporter and fixture sets incorporating the same

Methodology for cleaning of surface metal contamination from electrode assemblies

Cleaning of bonded silicon electrodes

Process chamber component having electroplated yttrium containing coating

Bare aluminum baffles for resist stripping chambers

Extending lifetime of yttrium oxide as a plasma chamber material

Method of manufacturing a process chamber component having yttrium-aluminum coating

Process chamber component having electroplated yttrium containing coating

Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses

Electroplating an yttrium-containing coating on a chamber component

Cleaning methods for silicon electrode assembly surface contamination removal

Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof

Silicon electrode assembly surface decontamination by acidic solution

Cleaning methods for silicon electrode assembly surface contamination removal

Methods for silicon electrode assembly etch rate and etch uniformity recovery

Wet cleaning of electrostatic chucks

Bare aluminum baffles for resist stripping chambers

Methods for wet cleaning quartz surfaces of components for plasma processing chambers

Process chamber having component with yttrium-aluminum coating

Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system