Campbell, California
United States
138
2024-08-01
The entities that hold a legal rights for patent applications filed by inventor Yudovsky Joseph:
Joseph Yudovsky from Campbell, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Apparatus and methods for semiconductor processing
#2 | 2023-05-11Apparatus and methods for semiconductor processing
#3 | 2023-04-13Contour pocket and hybrid susceptor for wafer uniformity
#4 | 2022-05-26Injector for batch processing and methods of use
#5 | 2022-03-03ROTARY REACTOR FOR UNIFORM PARTICLE COATING WITH THIN FILMS
#6 | 2021-12-09Apparatus and methods for wafer chucking on a susceptor for ALD
#7 | 2021-09-30Enhanced spatial ALD of metals through controlled precursor mixing
#8 | 2021-03-04ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS
#9 | 2021-03-04ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS
#10 | 2021-02-25DEFLECTION RESTRAINT SYSTEM FOR BUILD PLATE IN ADDITIVE MANUFACTURING
#11 | 2020-11-26Patterned vacuum chuck for double-sided processing
#12 | 2020-10-01Contour pocket and hybrid susceptor for wafer uniformity
#13 | 2020-09-17GATE VALVE FOR CONTINUOUS TOW PROCESSING
#14 | 2020-09-17QUALIFICATION AND REPAIR STATION
#15 | 2020-03-19Device to increase deposition uniformity in spatial ALD processing chamber
#16 | 2020-01-30Temporal atomic layer deposition process chamber
#17 | 2019-12-12Rotary reactor for uniform particle coating with thin films
#18 | 2019-12-12Rotary reactor for uniform particle coating with thin films
#19 | 2019-10-31In-situ wafer rotation for carousel processing chambers
#20 | 2019-08-22PATTERNED VACUUM CHUCK FOR DOUBLE-SIDED PROCESSING
#21 | 2019-08-08Position and temperature monitoring of ALD platen susceptor
#22 | 2019-06-27Wafer processing systems including multi-position batch load lock apparatus with temperature control capability
#23 | 2019-06-20Apparatus and methods for wafer rotation in carousel susceptor
#24 | 2019-04-11Spring-Loaded Pins For Susceptor Assembly And Processing Methods Using Same
#25 | 2018-08-23Enhanced spatial ALD of metals through controlled precursor mixing
#26 | 2018-07-26Apparatus and methods for wafer chucking on a susceptor for ALD
#27 | 2018-07-05Apparatus and methods for wafer rotation to improve spatial ALD process uniformity
#28 | 2018-06-07Integrated Atomic Layer Deposition Tool
#29 | 2018-01-04Device to increase deposition uniformity in spatial ALD processing chamber
#30 | 2017-12-28Apparatus for susceptor temperature verification and methods of use
#31 | 2017-12-07Contour pocket and hybrid susceptor for wafer uniformity
#32 | 2017-10-26Apparatus for prevention of backside deposition in a spatial ALD process chamber
#33 | 2017-10-26Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing
#34 | 2017-10-05Apparatus and methods for wafer rotation in carousel susceptor
#35 | 2017-09-14Intelligent hardstop for gap detection and control mechanism
#36 | 2017-07-06High temperature heater for processing chamber
#37 | 2017-07-06Non-metallic thermal CVD/ALD Gas Injector and Purge Systems
#38 | 2017-03-16Plasma Module With Slotted Ground Plate
#39 | 2017-02-23Heating Source For Spatial Atomic Layer Deposition
#40 | 2016-12-22Injector for batch processing and methods of use
#41 | 2016-12-08Susceptor position and rational apparatus and methods of use
#42 | 2016-09-29Wafer processing systems including multi-position batch load lock apparatus with temperature control capability
#43 | 2016-09-22Elongated capacitively coupled plasma source for high temperature low pressure environments
#44 | 2016-07-28Intelligent hardstop for gap detection and control mechanism
#45 | 2016-07-28Injector For Spatially Separated Atomic Layer Deposition Chamber
#46 | 2016-04-07Spring-loaded pins for susceptor assembly and processing methods using same
#47 | 2016-04-07Top lamp module for carousel deposition chamber
#48 | 2016-03-10Lamp Heater For Atomic Layer Deposition
#49 | 2016-01-28Position and temperature monitoring of ALD platen susceptor
#50 | 2016-01-28Carousel Gas Distribution Assembly With Optical Measurements
#51 | 2016-01-28Atmospheric lid with rigid plate for carousel processing chambers
#52 | 2016-01-28Plasma Source For Rotating Platen ALD Chambers
#53 | 2016-01-21Apparatus and methods for wafer chucking on a susceptor for ALD
#54 | 2015-12-31Hole Pattern For Uniform Illumination Of Workpiece Below A Capacitively Coupled Plasma Source
#55 | 2015-12-31Apparatus And Methods For Differential Pressure Chucking Of Substrates
#56 | 2015-12-31Apparatus And Methods For Carousel Atomic Layer Deposition
#57 | 2015-12-31Wafer placement and gap control optimization through in situ feedback
#58 | 2015-12-24Apparatus And Process Containment For Spatially Separated Atomic Layer Deposition
#59 | 2015-12-03Apparatus and methods for injector to substrate gap control
#60 | 2015-10-22Auto-refill ampoule and methods of use
#61 | 2015-10-22Apparatus for susceptor temperature verification and methods of use
#62 | 2015-08-20Integrated two-axis lift-rotation motor center pedestal in multi-wafer carousel ALD
#63 | 2015-05-28Tilted Plate For Batch Processing And Methods Of Use
#64 | 2015-05-14Methods for atomic layer etching
#65 | 2015-03-05Hot wall reactor with cooled vacuum containment
#66 | 2015-02-19Elongated capacitively coupled plasma source for high temperature low pressure environments
#67 | 2014-09-18TEMPERATURE CONTROL SYSTEMS AND METHODS FOR SMALL BATCH SUBSTRATE HANDLING SYSTEMS
#68 | 2014-09-18Multi-position batch load lock apparatus and systems and methods including same
#69 | 2014-09-18Acoustically-monitored semiconductor substrate processing systems and methods
#70 | 2014-05-08Apparatus For Spatial Atomic Layer Deposition With Recirculation And Methods Of Use
#71 | 2014-04-17Methods for atomic layer etching
#72 | 2013-10-10Apparatus and method for providing uniform flow of gas
#73 | 2013-08-15Multi-Injector Spatial ALD Carousel and Methods of Use
#74 | 2013-08-01Multi-Chamber Substrate Processing System
#75 | 2013-08-01Rotary Substrate Processing System
#76 | 2013-08-01Sealing apparatus for a process chamber
#77 | 2013-06-27Self-Contained Heating Element
#78 | 2013-06-06Multi-Component Film Deposition
#79 | 2013-05-30Methods for atomic layer etching
#80 | 2013-04-25Apparatus and method for providing uniform flow of gas
#81 | 2013-01-24Reactant Delivery System For ALD/CVD Processes
#82 | 2012-10-25Hot Wire Atomic Layer Deposition Apparatus And Methods Of Use
#83 | 2012-09-06Apparatus And Process For Atomic Layer Deposition
#84 | 2012-09-06Apparatus and Process for Atomic Layer Deposition
#85 | 2012-09-06Apparatus and Process for Atomic Layer Deposition
#86 | 2012-09-06Apparatus and Process for Atomic Layer Deposition
#87 | 2012-09-06Apparatus and Process for Atomic Layer Deposition
#88 | 2012-09-06Atomic layer deposition carousel with continuous rotation and methods of use
#89 | 2012-09-06Apparatus And Process For Atomic Layer Deposition
#90 | 2012-09-06Apparatus And Process For Atomic Layer Deposition
#91 | 2012-09-06Apparatus And Process For Atomic Layer Deposition
#92 | 2012-09-06Apparatus and Process for Atomic Layer Deposition
#93 | 2012-09-06Atomic Layer Deposition Carousel with Continuous Rotation and Methods of Use
#94 | 2012-08-23SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER
#95 | 2012-08-02PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL
#96 | 2012-05-31Apparatus and Process for Atomic Layer Deposition
#97 | 2012-05-03Flow Meter With Improved Thermal Stability And Methods Of Use
#98 | 2011-09-15Atomic layer deposition chamber with multi inject
#99 | 2011-06-30Wafer edge cleaning
#100 | 2011-02-24BATCH PROCESSING PLATFORM FOR ALD AND CVD
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