Patrick Lomtscher

City:

Dresden

Country:

Germany

Published Applications:

Last publication date:

2021-06-24

Top Assignees for applications by Patrick Lomtscher

The entities that hold a legal rights for patent applications filed by inventor Lomtscher Patrick:

Patrick Lomtscher from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Wafer exposure method using wafer models and wafer fabrication assembly

Run to run control for lens aberrations

System for analyzing images of blazed phase grating samples

Optimizing light path uniformity in inspection systems

Optimizing focal plane fitting functions for an image field on a substrate

InventorID:

4691710 ⎘