Karin Eggers

City:

Dresden

Country:

Germany

Published Applications:

Last publication date:

2006-11-16

Top Assignees for applications by Karin Eggers

The entities that hold a legal rights for patent applications filed by inventor Eggers Karin:

Karin Eggers from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Photo mask and method to form a self-assembled monolayer and an inorganic ultra thin film on the photo mask

Method for dynamically monitoring a reticle

InventorID:

4734859 ⎘