Jong Won Yun

City:

Daegu

Country:

South Korea

Published Applications:

Last publication date:

2026-05-07

Top Assignees for applications by Jong Won Yun

The entities that hold a legal rights for patent applications filed by inventor Yun Jong Won:

Jong Won Yun from Daegu, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH HARD MASK FILM CONTAINING CHROME AND NIOBIUM

REVERSE PHOTOMASK THAT PHASE SHIFT FILM PATTERN IS USED FOR REFLECTIVE PATTERN, AND BLANKMASK FOR MANUFACTURING THE SAME

Crude exopolysaccharides produced from phellinus baumii mycelium having hypoglycemic activity and preparation method thereof

InventorID:

4742777 ⎘