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Assignee profile:

S&S TECH Co., Ltd.

City:

Daegu

Country:

South Korea

Published Applications:

Last publication date:

2026-05-07

Patent Grants:

Last grant date:

2024-03-26

Top Inventors for applications by S&S TECH Co., Ltd.

These are the the leading inventors for applications assigned to S&S TECH Co., Ltd.:

Chul-Kyu YANG 7 Daegu, South Korea
Mi-Kyung WOO 5 Daegu, South Korea
Min Kyu Park 4 Daegu, South Korea
Yong-Dae KIM 3 Daegu, South Korea

Jong Won Yun 2 Daegu, South Korea
Geung-Won KANG 2 Daegu, South Korea
Jong-Hwa LEE 2 Daegu, South Korea
Cheol SHIN 2 Daegu, South Korea

Chang-Jun KIM 2 Daegu, South Korea
Min-Kwang PARK 2 Daegu, South Korea
Kee-Soo NAM 2 Daegu, South Korea
Kyu-Jin JANG 2 Daegu, South Korea

Min-Ki CHOI 1 Daegu, South Korea
See-Jun JEONG 1 Daegu, South Korea
Mun-Su CHOI 1 Daegu, South Korea
Ju-Hee HONG 1 Daegu, South Korea

Cheol SHIN 1 Daegu-si, South Korea
Dong-Hoi KIM 1 Daegu, South Korea
Sang-Min JEONG 1 Daegu, South Korea
Yong-Dae KIM 1 Daegu-si, South Korea

Mi-Kyung WOO 1 Daegu-si, South Korea
Min-Kwang PARK 1 Daegu-si, South Korea
Chul-Kyun PARK 1 Daegu, South Korea
Chul-Kyu YANG 1 Daegu-si, South Korea

Jong-Hwa LEE 1 Daegu-si, South Korea

Recent patent applications by S&S TECH Co., Ltd.

S&S TECH Co., Ltd. based in Daegu, KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2026-05-07

US20260126715A1

Physics

BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH HARD MASK FILM CONTAINING CHROME AND NIOBIUM

#2 | 2025-07-17

US20250231476A1

Physics

FRAME ASSEMBLY USED FOR MOUNTING PELLICLE ON PHOTOMASK

#3 | 2025-07-17

US20250231473A1

Physics

REVERSE PHOTOMASK THAT PHASE SHIFT FILM PATTERN IS USED FOR REFLECTIVE PATTERN, AND BLANKMASK FOR MANUFACTURING THE SAME

#4 | 2025-04-17

US20250123551A1

Physics

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM OF CrSb

#5 | 2024-10-03

US20240329516A1

Physics

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

#6 | 2024-10-03

US20240329515A1

Physics

BLANKMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM, AND PHOTOMASK FABRICATED WITH THE SAME

#7 | 2024-02-01

US20240036461A1

Physics

PELLICLE FOR EUV LITHOGRAPHY

#8 | 2022-07-28 ✅ Patent 11,940,725 granted on 2024-03-26

US20220236635A1

Physics

Phase shift blankmask and photomask for EUV lithography

#9 | 2015-09-24 ✅ Patent 9,551,925 granted on 2017-01-24

US20150268552A1

Physics

Blankmask and photomask using the same

#10 | 2015-04-02 ✅ Patent 9,482,940 granted on 2016-11-01

US20150093689A1

Physics

Blankmask and photomask

Also check out S&S TECH Co., Ltd.'s (Daegu, South Korea) applicant profile with 9 patent applications submitted.

AssigneeID:

346849 ⎘