Alameda, California
United States
3
2008-11-25
The entities that hold a legal rights for patent applications filed by inventor Drewery John:
John Drewery from Alameda, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for enhancing the nucleation and morphology of ruthenium films on dielectric substrates using amine containing compounds
#2 | 2007-05-01Method for enhancing the nucleation and morphology of ruthenium films on dielectric substrates using amine containing compounds
#3 | 2005-05-12Methods for the electrochemical deposition of copper onto a barrier layer of a work piece
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