Andreas Lopp

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

VAPOR SOURCE, NOZZLE, AND METHOD OF DEPOSITING AN EVAPORATED MATERIAL ON A SUBSTRATE

TEMPERATURE-CONTROLLED SHIELD, MATERIAL DEPOSITION APPARATUS AND METHOD FOR DEPOSITING A MATERIAL ONTO A SUBSTRATE

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

NOZZLE FOR A DISTRIBUTOR OF A MATERIAL DEPOSITION SOURCE, MATERIAL DEPOSITION SOURCE, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL

Material deposition apparatus having at least one heating assembly and method for pre- and/or post-heating a substrate

Temperature-controlled shield, material deposition apparatus and method for depositing a material onto a substrate

Vapor deposition apparatus and method for coating a substrate in a vacuum chamber

Mask arrangement for masking a substrate in a processing chamber, apparatus for depositing a layer on a substrate, and method for aligning a mask arrangement for masking a substrate in a processing chamber

MASK ARRANGEMENT FOR MASKING A SUBSTRATE IN A PROCESSING CHAMBER

MATERIAL DEPOSITION ARRANGEMENT, A VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL

MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION

ADJUSTABLE MASK

SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL

EVAPORATION SYSTEM AND METHOD

Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system

SPUTTER DEPOSITION SYSTEM AND METHOD

REACTIVE GAS DISTRIBUTOR, REACTIVE GAS TREATMENT SYSTEM, AND REACTIVE GAS TREATMENT METHOD

Flooding Chamber For Coating Installations

Method for operating a sputter cathode with a target

Magnet arrangement for a planar magnetron