Benjamin David WRIGHT

City:

Cambridge

Country:

United Kingdom

Published Applications:

Last publication date:

2025-02-27

Top Assignees for applications by Benjamin David WRIGHT

The entities that hold a legal rights for patent applications filed by inventor WRIGHT Benjamin David:

AIXTRON SE 2 Herzogenrath, Germany

Recent patent applications by WRIGHT Benjamin David

Benjamin David WRIGHT from Cambridge, GB has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-02-27

US20250066917A1

Chemistry; metallurgy

COVER PLATE FOR COVERING THE SUSCEPTOR SIDE FACING THE PROCESS CHAMBER OF A DEVICE FOR DEPOSITING SIC LAYERS

#2 | 2022-12-15

US20220396877A1

Chemistry; metallurgy

WALL-COOLED GAS-INLET ELEMENT FOR A CVD REACTOR

#3 | 2021-08-19

US20210254214A1

Chemistry; metallurgy

Cover plate for covering the susceptor side facing the process chamber of a device for depositing SiC layers

#4 | 2021-08-05

US20210238740A1

Chemistry; metallurgy

CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor

InventorID:

5153768 ⎘