Assignee profile:

AIXTRON SE

City:

Herzogenrath

Country:

Germany

Published Applications:

75

Last publication date:

2024-05-09

Patent Grants:

72

Last grant date:

2025-06-10

Top Inventors for applications by AIXTRON SE

These are the the leading inventors for applications assigned to AIXTRON SE:

Recent patent applications by AIXTRON SE

AIXTRON SE based in Herzogenrath, DE has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2024-05-09 ✅ Patent 12,325,912 granted on 2025-06-10
US20240150891A1
Chemistry; metallurgy

APPARATUS AND METHOD FOR DEPOSITING CARBON-CONTAINING STRUCTURES

#2 | 2023-11-30 ✅ Patent 12,584,222 granted on 2026-03-24
US20230383408A1
Chemistry; metallurgy

METHODS FOR THERMAL TREATMENT OF SUBSTRATES

#3 | 2023-11-23 ✅ Patent 12,398,466 granted on 2025-08-26
US20230374664A1
Chemistry; metallurgy

METHOD FOR EMISSIVITY-CORRECTED PYROMETRY

#4 | 2023-11-09 ✅ Patent 12,084,768 granted on 2024-09-10
US20230357928A1
Chemistry; metallurgy

Method for using shield plate in a CVD reactor

#5 | 2023-09-21 ✅ Patent 12,577,674 granted on 2026-03-17
US20230295807A1
Chemistry; metallurgy

METHOD FOR IDENTIFYING SUBSTRATES WHICH ARE FAULTY OR HAVE BEEN INCORRECTLY INSERTED INTO A CVD REACTOR

#6 | 2023-02-09 ✅ Patent 12,320,002 granted on 2025-06-03
US20230041558A1
Chemistry; metallurgy

CVD reactor and method for controlling the surface temperature of the substrates

#7 | 2022-08-18 ✅ Patent 12,084,767 granted on 2024-09-10
US20220259737A1
Chemistry; metallurgy

Gas-inlet element for a CVD reactor

#8 | 2022-06-16 ✅ Patent 12,435,422 granted on 2025-10-07
US20220186375A1
Chemistry; metallurgy

METHOD FOR RECORDING A STATE OF A CVD REACTOR UNDER PRODUCTION CONDITIONS

#9 | 2022-06-16 ✅ Patent 12,110,591 granted on 2024-10-08
US20220186374A1
Chemistry; metallurgy

Susceptor arrangement of a CVD reactor

#10 | 2022-04-07 ✅ Patent 12,577,670 granted on 2026-03-17
US20220106687A1
Chemistry; metallurgy

CVD REACTOR HAVING MEANS FOR LOCALLY INFLUENCING THE SUSCEPTOR TEMPERATURE

#11 | 2022-03-10 ✅ Patent 12,305,282 granted on 2025-05-20
US20220074047A1
Chemistry; metallurgy

Susceptor of a CVD reactor

#12 | 2022-02-17 ✅ Patent 11,887,848 granted on 2024-01-30
US20220051893A1
Electricity

Nucleation layer deposition method

#13 | 2022-02-03 ✅ Patent 12,098,462 granted on 2024-09-24
US20220033965A1
Chemistry; metallurgy

Method for producing a component part of a CVD reactor

#14 | 2022-01-06 ✅ Patent 11,746,419 granted on 2023-09-05
US20220002872A1
Chemistry; metallurgy

Shield plate for a CVD reactor

#15 | 2021-10-07 ✅ Patent 11,713,505 granted on 2023-08-01
US20210310120A1
Chemistry; metallurgy

Device and method for controlling the ceiling temperature of a CVD reactor

#16 | 2021-08-26 ✅ Patent 12,359,319 granted on 2025-07-15
US20210262087A1
Chemistry; metallurgy

ARRANGEMENT FOR MEASURING THE SURFACE TEMPERATURE OF A SUSCEPTOR IN A CVD REACTOR

#17 | 2021-08-19 ✅ Patent 12,180,590 granted on 2024-12-31
US20210254214A1
Chemistry; metallurgy

Cover plate for covering the susceptor side facing the process chamber of a device for depositing SiC layers

#18 | 2021-08-05 ✅ Patent 12,234,553 granted on 2025-02-25
US20210238740A1
Chemistry; metallurgy

CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor

#19 | 2021-06-24 ✅ Patent 12,012,654 granted on 2024-06-18
US20210189565A1
Chemistry; metallurgy

Device for coating a substrate with a carbon-containing coating

#20 | 2021-03-11 ✅ Patent 11,669,072 granted on 2023-06-06
US20210072731A1
Physics

Device and method for obtaining information about layers deposited in a CVD method

#21 | 2021-02-04 ✅ Patent 11,959,190 granted on 2024-04-16
US20210032771A1
Chemistry; metallurgy

Device for connecting a susceptor to a drive shaft

#22 | 2020-10-08 ✅ Patent 11,702,740 granted on 2023-07-18
US20200318235A1
Chemistry; metallurgy

Closure element for closing a loading opening of an inner housing of a CVD reactor

#23 | 2020-05-14 ✅ Patent 11,441,223 granted on 2022-09-13
US20200149163A1
Chemistry; metallurgy

Susceptor for a CVD reactor

#24 | 2020-04-23 ✅ Patent 11,851,762 granted on 2023-12-26
US20200123657A1
Chemistry; metallurgy

Coating device having coated transmitter coil

#25 | 2020-02-27 ✅ Patent 11,052,486 granted on 2021-07-06
US20200061749A1
Performing operations; transporting

Method and apparatus for producing a structure seed layer using a laser beam

#26 | 2020-01-30 ✅ Patent 11,187,676 granted on 2021-11-30
US20200033295A1
Physics

Device and method for determining the concentration of a vapor

#27 | 2020-01-30 ✅ Patent 11,268,934 granted on 2022-03-08
US20200033294A1
Physics

Device and method for determining the concentration of a vapor

#28 | 2020-01-09 ✅ Patent 11,479,851 granted on 2022-10-25
US20200010951A1
Chemistry; metallurgy

Substrate holder arrangement with mask support

#29 | 2020-01-09 ✅ Patent 11,396,697 granted on 2022-07-26
US20200010950A1
Chemistry; metallurgy

Device for separating a structured layer on a substrate, and method for setting up the device

#30 | 2019-08-29 ✅ Patent 11,286,566 granted on 2022-03-29
US20190264323A1
Chemistry; metallurgy

Apparatus for deposition of a III-V semiconductor layer

#31 | 2019-07-25 ✅ Patent 10,734,584 granted on 2020-08-04
US20190229267A1
Electricity

Coating device and coating method

#32 | 2019-07-25 ✅ Patent 10,883,171 granted on 2021-01-05
US20190226082A1
Chemistry; metallurgy

CVD reactor and method for cleaning a CVD reactor

#33 | 2019-06-27 ✅ Patent 11,168,410 granted on 2021-11-09
US20190194820A1
Chemistry; metallurgy

Susceptor for a chemical vapour deposition reactor

#34 | 2019-02-28 ✅ Patent 10,544,519 granted on 2020-01-28
US20190062947A1
Chemistry; metallurgy

Method and apparatus for surface preparation prior to epitaxial deposition

#35 | 2018-09-20 ✅ Patent 10,472,718 granted on 2019-11-12
US20180265984A1
Chemistry; metallurgy

Temperature-controlled gas supply line with dilution gas flows supplied at multiple locations

#36 | 2018-08-09 ✅ Patent 10,526,705 granted on 2020-01-07
US20180223425A1
Chemistry; metallurgy

Methods for controlling the substrate temperature using a plurality of flushing gases

#37 | 2018-07-19 ✅ Patent 10,526,708 granted on 2020-01-07
US20180202046A1
Chemistry; metallurgy

Methods for forming thin protective and optical layers on substrates

#38 | 2018-05-31 ✅ Patent 10,501,847 granted on 2019-12-10
US20180148836A1
Chemistry; metallurgy

Apparatus and method for generating a vapor for a CVD or PVD device

#39 | 2017-11-02 ✅ Patent 10,822,701 granted on 2020-11-03
US20170314134A1
Chemistry; metallurgy

CVD or PVD reactor for coating large-area substrates

#40 | 2017-11-02 ✅ Patent 10,563,300 granted on 2020-02-18
US20170314122A1
Chemistry; metallurgy

Method for separating a carbon structure from a seed structure

#41 | 2017-10-12 ✅ Patent 10,096,473 granted on 2018-10-09
US20170294306A1
Electricity

Formation of a layer on a semiconductor substrate

#42 | 2017-10-05 ✅ Patent 10,294,562 granted on 2019-05-21
US20170283946A1
Chemistry; metallurgy

Exhaust manifold in a CVD reactor

#43 | 2017-09-14 ✅ Patent 9,988,712 granted on 2018-06-05
US20170260624A1
Chemistry; metallurgy

Substrate holding device

#44 | 2017-08-01 ✅ Patent 9,721,759 granted on 2017-08-01
US15090486
Electricity

System and method for distributing RF power to a plasma source

#45 | 2017-06-01 ✅ Patent 11,053,586 granted on 2021-07-06
US20170152598A1
Chemistry; metallurgy

Coated flat component in a CVD reactor

#46 | 2017-05-04
US20170125269A1
Electricity

TRANSFER MODULE FOR A MULTI-MODULE APPARATUS

#47 | 2017-04-27 ✅ Patent 10,060,022 granted on 2018-08-28
US20170114445A1
Chemistry; metallurgy

Device and method for generating a vapor for a CVD or PVD device from multiple liquid or solid source materials

#48 | 2017-04-20 ✅ Patent 10,260,147 granted on 2019-04-16
US20170107613A1
Chemistry; metallurgy

Device for depositing nanotubes

#49 | 2017-01-19 ✅ Patent 10,267,768 granted on 2019-04-23
US20170016859A1
Physics

Device and method for determining the concentration of a vapor by means of an oscillating body sensor

#50 | 2017-01-05 ✅ Patent 10,273,580 granted on 2019-04-30
US20170002462A1
Chemistry; metallurgy

Heating device

#51 | 2016-11-10 ✅ Patent 10,323,322 granted on 2019-06-18
US20160326644A1
Chemistry; metallurgy

Gas inlet element of a CVD reactor with weight-reduced gas outlet plate

#52 | 2016-08-04 ✅ Patent 9,793,104 granted on 2017-10-17
US20160225608A1
Electricity

Preparing a semiconductor surface for epitaxial deposition

#53 | 2016-07-14 ✅ Patent 10,438,823 granted on 2019-10-08
US20160204008A1
Electricity

Substrate treatment device

#54 | 2016-06-16 ✅ Patent 10,316,408 granted on 2019-06-11
US20160168697A1
Chemistry; metallurgy

Delivery device, manufacturing system and process of manufacturing

#55 | 2016-04-21 ✅ Patent 9,831,466 granted on 2017-11-28
US20160111684A1
Electricity

Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier

#56 | 2016-03-17 ✅ Patent 9,847,241 granted on 2017-12-19
US20160079104A1
Electricity

Transport module for a semiconductor fabrication device or coupling device

#57 | 2016-03-17 ✅ Patent 9,670,580 granted on 2017-06-06
US20160076145A1
Chemistry; metallurgy

MOCVD layer growth method with subsequent multi-stage cleaning step

#58 | 2016-01-07 ✅ Patent 9,942,946 granted on 2018-04-10
US20160007410A1
Electricity

Device for generating vapor from solid or liquid starting material for CVD or PVD apparatus

#59 | 2015-11-12 ✅ Patent 9,970,106 granted on 2018-05-15
US20150322566A1
Chemistry; metallurgy

CVD system having particle separator

#60 | 2015-10-15 ✅ Patent 10,329,668 granted on 2019-06-25
US20150292083A1
Chemistry; metallurgy

Device and method for exhaust gas treatment on CVD reactor

#61 | 2015-09-24 ✅ Patent 9,443,702 granted on 2016-09-13
US20150270109A1
Electricity

Methods for plasma processing

#62 | 2015-06-04 ✅ Patent 9,564,329 granted on 2017-02-07
US20150155157A1
Electricity

Method and apparatus for fabricating dielectric structures

#63 | 2015-05-21 ✅ Patent 9,822,451 granted on 2017-11-21
US20150140234A1
Chemistry; metallurgy

Device and method for manufacturing nanostructures consisting of carbon

#64 | 2015-02-19 ✅ Patent 9,159,608 granted on 2015-10-13
US20150050806A1
Electricity

Method for forming TiSiN thin film layer by using atomic layer deposition

#65 | 2015-01-08 ✅ Patent 9,587,312 granted on 2017-03-07
US20150007771A1
Chemistry; metallurgy

Gas inlet member of a CVD reactor

#66 | 2014-08-21 ✅ Patent 10,221,482 granted on 2019-03-05
US20140231550A1
Chemistry; metallurgy

Gas distributor for a CVD reactor

#67 | 2014-07-03
US20140186527A1
Chemistry; metallurgy

Device and method for processing strip-type substrates

#68 | 2013-02-14
US20130040054A1
Chemistry; metallurgy

COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A SHIELDING PLATE

#69 | 2012-08-16 ✅ Patent 9,447,500 granted on 2016-09-20
US20120204796A1
Chemistry; metallurgy

CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones

#70 | 2012-06-14 ✅ Patent 9,018,105 granted on 2015-04-28
US20120149212A1
Chemistry; metallurgy

CVD method and CVD reactor

#71 | 2012-04-19 ✅ Patent 8,846,501 granted on 2014-09-30
US20120094474A1
Chemistry; metallurgy

Method for equipping an epitaxy reactor

#72 | 2011-12-01 ✅ Patent 8,841,221 granted on 2014-09-23
US20110294283A1
Chemistry; metallurgy

MOCVD reactor having cylindrical gas inlet element

#73 | 2011-07-21 ✅ Patent 9,045,818 granted on 2015-06-02
US20110174217A1
Chemistry; metallurgy

Shadow mask held magnetically on a substrate support

#74 | 2011-01-13 ✅ Patent 10,049,859 granted on 2018-08-14
US20110005681A1
Electricity

Plasma generating units for processing a substrate

#75 | 2009-01-15 ✅ Patent 8,349,081 granted on 2013-01-08
US20090013930A1
Chemistry; metallurgy

Gas distributor with pre-chambers arranged in planes

Also check out AIXTRON SE's (Herzogenrath, Germany) applicant profile with 74 patent applications submitted.

AssigneeID:

9345 ⎘