Inventor profile of:

David M. Williamson

City:

Tucson, Arizona

Country:

United States

Published Applications:

36

Last publication date:

2025-11-06

Top Assignees for applications by David M. Williamson

The entities that hold a legal rights for patent applications filed by inventor Williamson David M.:

Recent patent applications by Williamson David M.

David M. Williamson from Tucson, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-11-06
US20250339026A1
Human necessities

OPTICAL SYSTEM FOR CONVERTIBLE IMAGING OF POSTERIOR AND ANTERIOR PORTIONS OF THE EYE

#2 | 2024-10-24
US20240350006A1
Human necessities

OPHTHALMIC OPTICAL SYSTEM, OPHTHALMIC OBJECTIVE LENS, AND OPHTHALMIC DEVICE

#3 | 2023-08-31
US20230270328A1
Human necessities

Wide-angle pupil relay for cellphone-based fundus camera

#4 | 2022-03-31
US20220095912A1
Human necessities

OPTICAL SYSTEM FOR CONVERTIBLE IMAGING OF POSTERIOR AND ANTERIOR PORTIONS OF THE EYE

#5 | 2021-04-01
US20210093194A1
Human necessities

Ophthalmic optical system, ophthalmic objective lens, and ophthalmic device

#6 | 2020-04-16
US20200117099A1
Physics

Optical objective for operation in EUV spectral region

#7 | 2020-03-05
US20200073251A1
Physics

Illumination system with curved 1d-patterned mask for use in EUV-exposure tool

#8 | 2020-02-20
US20200057373A1
Physics

Illumination system with flat 1D-patterned mask for use in EUV-exposure tool

#9 | 2019-08-29
US20190261853A1
Human necessities

Wide-angle pupil relay for cellphone-based fundus camera

#10 | 2019-08-29
US20190261851A1
Human necessities

Catadioptric unit-magnification afocal pupil relay and optical imaging system employing the same

#11 | 2019-08-01
US20190235393A1
Physics

Extreme ultraviolet lithography system that utilizes pattern stitching

#12 | 2019-04-18
US20190113723A1
Physics

HIGH NA (NUMERICAL APERTURE) RECTANGULAR FIELD EUV CATOPTRIC PROJECTION OPTICS USING TILTED AND DECENTERED ZERNIKE POLYNOMIAL MIRROR SURFACES

#13 | 2018-09-27
US20180275387A1
Physics

Broadband catadioptric microscope objective with small central obscuration

#14 | 2017-11-23
US20170336720A1
Physics

Extreme ultraviolet lithography system that utilizes pattern stitching

#15 | 2017-11-23
US20170336716A1
Physics

EUV lithography system for dense line patterning

#16 | 2017-11-23
US20170336715A1
Physics

Euv lithography system for dense line patterning

#17 | 2017-10-26
US20170307863A1
Physics

Catadioptric imaging systems for digital scanner

#18 | 2017-08-17
US20170235120A1
Physics

Non-telecentric multispectral stereoscopic endoscope objective

#19 | 2017-07-13
US20170199371A1
Physics

Multispectral stereoscopic endoscope system and use of same

#20 | 2015-05-28
US20150146283A1
Physics

Catadioptric imaging systems for digital scanner

#21 | 2015-05-28
US20150146185A1
Physics

Catadioptric imaging systems for digital scanner

#22 | 2015-01-15
US20150015896A1
Physics

Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data

#23 | 2014-08-07
US20140218704A1
Physics

HIGH NA (NUMERICAL APERTURE) RECTANGULAR FIELD EUV CATOPTRIC PROJECTION OPTICS USING TILTED AND DECENTERED ZERNIKE POLYNOMIAL MIRROR SURFACES

#24 | 2013-11-07
US20130293900A1
Physics

Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data

#25 | 2011-12-08
US20110299184A1
Physics

High NA annular field catoptric projection optics using Zernike polynomial mirror surfaces

#26 | 2011-12-08
US20110299056A1
Physics

System and Method Configured to Provide Predetermined Depth Of Focus and to Control Irradiance Distribution

#27 | 2010-04-15
US20100091257A1
Physics

Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location

#28 | 2010-03-11
US20100059657A1
Physics

System and Method Producing Data For Correcting Autofocus Error in An Imaging Optical System

#29 | 2010-03-04
US20100053738A1
Physics

High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations

#30 | 2009-12-24
US20090316131A1
Physics

Exposure apparatus that utilizes multiple masks

#31 | 2009-12-10
US20090305171A1
Physics

APPARATUS FOR SCANNING SITES ON A WAFER ALONG A SHORT DIMENSION OF THE SITES

#32 | 2009-12-10
US20090303454A1
Physics

EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM

#33 | 2009-10-22
US20090262417A1
Physics

193nm Immersion Microscope

#34 | 2008-10-02
US20080240182A1
Performing operations; transporting

Variable attenuator device and method

#35 | 2007-04-12
US20070080281A1
Physics

Imaging optical system configured with through the lens optics for producing control information

#36 | 2006-07-20
US20060158615A1
Physics

Catadioptric 1x projection system and method

InventorID:

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