Naoki NISHIGUCHI

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2023-02-02

Top Assignees for applications by Naoki NISHIGUCHI

The entities that hold a legal rights for patent applications filed by inventor NISHIGUCHI Naoki:

JSR Corporation 4 Tokyo, Japan
ISR CORPORATION 1 Tokyo, Japan

Recent patent applications by NISHIGUCHI Naoki

Naoki NISHIGUCHI from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-02-02

US20230036031A1

Physics

Photosensitive resin composition, method for producing resist pattern film, method for producing plated formed product, and method for producing tin-silver plated-formed product

#2 | 2022-02-24

US20220057714A1

Physics

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT

#3 | 2021-10-21

US20210325783A1

Physics

Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus

#4 | 2021-10-07

US20210311391A1

Physics

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE

InventorID:

5209882 ⎘