Inventor profile of:

Yanfu Lu

City:

Phoenix, Arizona

Country:

United States

Published Applications:

19

Last publication date:

2026-05-28

Top Assignees for applications by Yanfu Lu

The entities that hold a legal rights for patent applications filed by inventor Lu Yanfu:

Recent patent applications by Lu Yanfu

Yanfu Lu from Phoenix, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-28
US20260148940A1
Electricity

SEMICONDUCTOR PROCESSING SYSTEMS INCLUDING PROCESS MODULES AND GAS DELIVERY ASSEMBLIES CONFIGURED FOR PERFORMING CONCURRENT EPITAXIAL DEPOSITION OF MATERIAL LAYERS

#2 | 2026-05-28
US20260146364A1
Chemistry; metallurgy

PROCESS MODULES CONFIGURED FOR PERFORMING CONCURRENT EPITAXIAL DEPOSITION OF MATERIAL LAYERS AND SEMICONDUCTOR PROCESSING SYSTEMS INCLUDING SUCH PROCESS MODULES

#3 | 2026-03-19
US20260082851A1
Electricity

DUAL PYROMETER SYSTEMS FOR SUBSTRATE TEMPERATURE CONTROL DURING FILM DEPOSITION

#4 | 2026-01-01
US20260005050A1
Electricity

CHAMBER ARRANGEMENTS WITH OFFSET UPPER REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS, AND RELATED METHODS OF MAKING CHAMBER ARRANGEMENTS AND DEPOSITING MATERIAL LAYERS ONTO SUBSTRATES

#5 | 2025-08-28
US20250273461A1
Electricity

METHOD OF FORMING SEMICONDUCTOR STRUCTURE, SEMICONDUCTOR STRUCTURE, AND SEMICONDUCTOR PROCESSING SYSTEM

#6 | 2025-06-05
US20250183070A1
Electricity

CHAMBER ARRANGEMENTS WITH UPPER AND LOWER PYROMETERS, SEMICONDUCTOR PROCESSING SYSTEMS INCLUDING CHAMBER ARRANGEMENTS, AND MATERIAL LAYER DEPOSITION METHODS

#7 | 2025-02-13
US20250051918A1
Chemistry; metallurgy

FILM DEPOSITION SYSTEMS AND METHODS

#8 | 2024-10-03
US20240332016A1
Electricity

METHODS FOR SILICON GERMANIUM UNIFORMITY CONTROL USING MULTIPLE PRECURSORS

#9 | 2024-10-03
US20240331984A1
Electricity

PLASMA ENHANCED EPITAXIAL CHEMICAL VAPOR DEPOSITION SYSTEM

#10 | 2024-06-27
US20240209510A1
Chemistry; metallurgy

METHODS OF FORMING STRUCTURES, SEMICONDUCTOR PROCESSING SYSTEMS, AND SEMICONDUCTOR DEVICE STRUCTURES

#11 | 2024-06-20
US20240204057A1
Electricity

METHODS FOR FORMING SEMICONDUCTOR STACKED STRUCTURES ON A SUBSTRATE AND RELATED SEMICONDUCTOR STRUCTURES

#12 | 2024-06-20
US20240203734A1
Electricity

METHODS FOR FORMING MULTILAYER STRUCTURES ON A SUBSTRATE AND RELATED MULTILAYER STRUCTURES

#13 | 2024-06-20
US20240203733A1
Electricity

MATERIAL LAYER DEPOSITION METHODS, MATERIAL LAYER STACKS, SEMICONDUCTOR PROCESSING SYSTEMS, AND RELATED COMPUTER PROGRAM PRODUCTS

#14 | 2024-02-29
US20240071805A1
Electricity

METHOD, ASSEMBLY AND SYSTEM FOR GAS INJECTION

#15 | 2024-02-29
US20240068103A1
Chemistry; metallurgy

CHAMBER ARRANGEMENTS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING CHAMBER ARRANGEMENTS, AND RELATED MATERIAL LAYER DEPOSITION METHODS

#16 | 2022-09-22
US20220301905A1
Electricity

DUAL PYROMETER SYSTEMS FOR SUBSTRATE TEMPERATURE CONTROL DURING FILM DEPOSITION

#17 | 2022-09-22
US20220298643A1
Chemistry; metallurgy

Methods of forming structures, semiconductor processing systems, and semiconductor device structures

#18 | 2022-09-08
US20220282370A1
Chemistry; metallurgy

Film deposition systems and methods

#19 | 2021-11-18
US20210358741A1
Electricity

Methods for silicon germanium uniformity control using multiple precursors

InventorID:

5246427 ⎘