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Inventor profile of:

Michael BINNARD

City:

Belmont, California

Country:

United States

Published Applications:

41

Last publication date:

2018-08-16

Top Assignees for applications by Michael BINNARD

The entities that hold a legal rights for patent applications filed by inventor BINNARD Michael:

NIKON CORPORATION 31 Tokyo, Japan
Nikon Corporation 6 , Japan
NIKON RESEARCH CORPORATION OF AMERICA 1 Belmont, CA United States

Recent patent applications by BINNARD Michael

Michael BINNARD from Belmont, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-08-16

US20180231898A1

APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE

#2 | 2018-04-19

US20180107121A1

Microelectromechanical mirror assembly

#3 | 2017-11-16

US20170329236A1

Positioning system using surface pattern recognition and interpolation

#4 | 2016-08-18

US20160238948A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#5 | 2015-10-22

US20150301459A1

Positioning system using surface pattern recognition and interpolation

#6 | 2015-09-24

US20150268563A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#7 | 2015-04-09

US20150098074A1

STAGE BRAKING SYSTEM FOR A MOTOR

#8 | 2015-04-09

US20150097498A1

Power minimizing controller for a stage assembly

#9 | 2015-02-26

US20150055107A1

Microelectromechanical mirror assembly

#10 | 2014-07-24

US20140204358A1

Magnetic sensor calibration and servo for planar motor stage

#11 | 2013-11-21

US20130308107A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#12 | 2013-11-14

US20130301022A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#13 | 2013-11-14

US20130301021A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#14 | 2013-11-14

US20130301020A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#15 | 2013-05-30

US20130135603A1

Performing operations; transporting

C-CORE ACTUATOR FOR MOVING A STAGE

#16 | 2011-02-03

US20110026000A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machine

#17 | 2011-02-03

US20110025999A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#18 | 2010-08-12

US20100203455A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#19 | 2008-11-13

US20080278705A1

Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage

#20 | 2008-09-18

US20080225253A1

Damper for a stage assembly

#21 | 2008-06-05

US20080128303A1

Device container assembly with adjustable retainers for a reticle

#22 | 2008-03-27

US20080074634A1

Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine

#23 | 2008-03-27

US20080073563A1

Exposure apparatus that includes a phase change circulation system for movers

#24 | 2007-11-29

US20070273857A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#25 | 2007-11-01

US20070252965A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#26 | 2007-10-25

US20070247602A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#27 | 2007-09-20

US20070216886A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#28 | 2007-08-23

US20070195300A1

Apparatus for maintaining immersion fluid in the gap under the projection lens during wafer exchange using a co-planar member in an immersion lithography machine

#29 | 2006-10-19

US20060232140A1

System and method for controlling a stage assembly

#30 | 2006-05-18

US20060104753A1

Stage assembly with lightweight fine stage and low transmissibility

#31 | 2006-05-18

US20060101928A1

Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage

#32 | 2006-02-16

US20060033894A1

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#33 | 2006-02-02

US20060023186A1

Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

#34 | 2006-01-17

US9759524

Reaction mass for a stage device

#35 | 2006-01-05

US20060001322A1

Dual flow circulation system for a mover

#36 | 2005-11-08

US10361700

Stage counter mass system

#37 | 2005-08-09

US10021053

Following stage planar motor

#38 | 2005-08-04

US20050168075A1

Circulation housing for a mover

#39 | 2005-01-20

US20050012403A1

Dual flow circulation system for a mover

#40 | 2005-01-18

US9925531

Stage assembly and exposure apparatus including the same

#41 | 2005-01-11

US9960584

Flexure supported wafer table

InventorID:

526754 ⎘