Albany, New York
United States
16
2026-04-16
The entities that hold a legal rights for patent applications filed by inventor Lefevre Scott:
Scott Lefevre from Albany, US has applied for patents for these inventions. The list has both pending applications and granted patents:
PATTERNING SEMICONDUCTOR MATERIALS USING SURFACE MODIFICATION TECHNIQUES
#2 | 2026-03-26IN-SITU WAFER MONITORING WITH DYNAMIC BACKSIDE GAS FEEDBACK CONTROL AS WAFER BOW COUNTERMEASURE
#3 | 2026-03-05METAL-BASED PROTECTION OF SILICON-CONTAINING EDGE REGION
#4 | 2026-01-29OPTICAL WAFER MONITORING
#5 | 2026-01-29ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO
#6 | 2025-07-24TUNGSTEN-BASED ADDITIVE FOR THROUGH-SUBSTRATE ETCHING
#7 | 2025-07-10METHODS FOR PROTECTING A PERIPHERAL EDGE AND BACKSIDE OF A SEMICONDUCTOR SUBSTRATE
#8 | 2025-04-03IN-SITU FLUORESCENCE-BASED CHAMBER AND WAFER MONITORING
#9 | 2024-11-28SYSTEMS AND METHODS FOR SEMICONDUCTOR ETCHING
#10 | 2024-07-18SYSTEMS AND METHODS FOR BONDING SEMICONDUCTOR DEVICES
#11 | 2024-07-11BONDING LAYER AND PROCESS
#12 | 2024-07-04Normal-incidence in-situ process monitor sensor
#13 | 2024-06-13APPARATUS AND METHODS FOR PROCESSING BONDING SEMICONDUCTOR WAFERS
#14 | 2024-05-23BONDING LAYER AND PROCESS
#15 | 2023-11-16Pre-etch treatment for metal etch
#16 | 2021-12-23Surface fluorination remediation for aluminium oxide electrostatic chucks
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