🔗 Permalink

Inventor profile of:

Mitsuo SATO

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2023-11-30

Top Assignees for applications by Mitsuo SATO

The entities that hold a legal rights for patent applications filed by inventor SATO Mitsuo:

JSR Corporation 12 Tokyo, Japan
JSP CORPORATION 1 Tokyo, Japan
Kyowa Kirin Co., Ltd. 1 Chiyoda-Ku, Tokyo, Japan
Hiroo Iwata 1 Kyoto-shi, Kyoto, Japan
Kyowa Hakko Kogyo Co., Ltd. 1 Chiyoda-ku, Tokyo, Japan
Yoshiki Sasai 1 Kobe-shi, Hyogo, Japan

Recent patent applications by SATO Mitsuo

Mitsuo SATO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-11-30

US20230383001A1

Chemistry; metallurgy

METHOD FOR TREATING OX40 RELATED DISEASE

#2 | 2016-06-23

US20160179003A1

Physics

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

#3 | 2013-10-03

US20130260315A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND

#4 | 2013-07-25

US20130189621A1

Physics

Radiation-sensitive resin composition, polymer and compound

#5 | 2013-05-16

US20130122426A1

Physics

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

#6 | 2013-02-21

US20130045446A1

Chemistry; metallurgy

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND

#7 | 2013-01-24

US20130022912A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND

#8 | 2012-11-01

US20120276482A1

Chemistry; metallurgy

Radiation sensitive resin composition, method for forming a pattern, polymer and compound

#9 | 2012-10-11

US20120258402A1

Chemistry; metallurgy

Photoresist composition, resist-pattern forming method, polymer, and compound

#10 | 2012-08-30

US20120219903A1

Physics

Radiation-sensitive resin composition

#11 | 2012-06-14

US20120148952A1

Chemistry; metallurgy

Radiation-sensitive resin composition and compound

#12 | 2012-04-05

US20120082934A1

Chemistry; metallurgy

Radiation-sensitive resin composition, polymer and compound

#13 | 2012-02-02

US20120028189A1

Chemistry; metallurgy

Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound

#14 | 2011-02-03

US20110027718A1

Chemistry; metallurgy

Radiation-sensitive resin composition and compound

#15 | 2008-07-03

US20080160617A1

Physics

AGENT FOR INDUCING EMBRYONIC STEM CELL TO ECTODERMAL CELL, METHOD FOR OBTAINING THE SAME, AND USE OF THE SAME

InventorID:

53251 ⎘